The composition and ultramicrohardness of thin films deposited by electron beam evaporation of aluminium, silicon and titanium, with a simultaneous 20 keV nitrogen ion bombardment, were investigated. The friction coefficient and wear resistance against steel were also measured. Only \leqslant50% of the incident nitrogen ions were incorporated during deposition. Under our experimental conditions, titanium oxycarbonitride and aluminium-nitrogen films containing 10–20% oxide were formed. Silicon reacted to produce a relatively pure substoichiometric SiN
x
random bonding alloy, which showed excellent wear resistance. Titanium oxycarbonitride films exhibited low friction against steel and a hardnesses approaching that of bulk TiN.
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