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Data science and technology offer transformative tools and methods to science. This review article highlights latest development and progress in the interdisciplinary field of data-driven plasma science (DDPS). A large amount of data and machine learning algorithms go hand in hand. Most plasma data, whether experimental, observational or computational, are generated or collected by machines today. It is now becoming impractical for humans to analyze all the data manually. Therefore, it is imperative to train machines to analyze and interpret (eventually) such data as intelligently as humans but far more efficiently in quantity. Despite the recent impressive progress in applications of data science to plasma science and technology, the emerging field of DDPS is still in its infancy. Fueled by some of the most challenging problems such as fusion energy, plasmaprocessing of materials, and fundamental understanding of the universe through observable plasma phenomena, it is expected that DDPS continues to benefit significantly from the interdisciplinary marriage between plasma science and data science into the foreseeable future. CONTENTSI. Introduction 6 II. Fundamental Data Science 6 A. Introduction 6 B. Data Reduction/Compression 7 C. Dimensional reduction and sparse modeling 8 D. ML-enhanced modeling and simulation 9 E. ML Hardware and integration with models 10 F. Workflow Automation 11 G. Uncertainty Quantification 12 H. Visualization and Data Understanding 13 I. ML Control Theory 15 III. Basic Plasma Physics and Laboratory Experiments A. Introduction B. Spectroscopy, imaging and tomography C. Sparse measurement and noise D. Synthetic instruments and data E. Experimental data visualization F. High-rep rate laser experiments G. Charged particle beams H. Control and Optimisation of Plasma Accelerator Experiments I. Dusty and complex plasmas J. Physics and machine learning K. Challenges and outlook 5 IV. Magnetic Confinement Fusion 36 A. Introduction 36 B. Data-Driven Physics Models 36 C. Optimizing experimental workflows with data-driven methods 37 D. Diagnostics and Fusion Data Streams 38 E. Prediction of Tokamak Disruption 39 F. Surrogate models of fusion plasma 40 G. Magnetic Fusion Energy Data Challenges and Solutions 41 H. Data Science for extreme scale simulation 43 I. Challenges and outlook 44 V. Inertial confinement fusion and high-energy-density physics 45 A. Introduction 45 B. Representation learning for multimodal data 45 C. Transfer learning for simulation and experimen 47 D. Uncertainty quantification and Bayesian inference 47 E. High-performance computing and simulation acceleration 49 F. Design exploration and optimization 49 G. Self-driving experimental facilities 51 H. Challenges and outlook 52 VI. Space and astronomical plasmas 52 A. Introduction 52 B. Space and ground instruments 53 C. Space weather prediction 55 D. Transfer learning to improve historic data 56 E. Surrogate models of fluid closures using machine learning 56 F. Magnetic reconnection 58 G. Challenges and outlook 60 VII. Plasma tec...

Metal target dry etching process applied for the organic light emitting diode display manufacturing is hard to control without the generation of the defect particles. A large amount of the metal-halide by-prodcucts with the non-volatile physical nature are produced in the large area plasma-assisted process chamber. To achieve high-density plasma-based throughput, the inductively coupled plasma type dry etchers were adopted for large-area display manufacturing processes. However, this type of plasma source causes the ion flux-driven damages on the chamber inner walls near the RF power supplied antenna. Sputtered Al atoms from the ceramic parts or etching targets were redeposited onto the chamber inner walls after they form the metal-halide compounds. Redeposited by-prodcucts have very high binding energies to decompose. Undecomposed layers were stuck on the chamber inner wall and flaked off later to form the defect particles. To control this undesired phenomenon, decomposition reaction activated—and plasma locality controlled—two types of ISDs (In Situ Dry cleanings) were designed. A more appropriate type of ISD had selected referring to the developed PI-VM (Plasma Information based Virtual Metrology) model, which qualifies the start of mass production after the discontinuities of the process. The big data set of equipment engineering system and optical emission spectroscopy, accumulated during the mass production, were parameterized to the PI parameters and were applied to the PI-VM modeling. Management of the mass production with the designed ISD and PI-VM model could reduce the 25% of defect particle driven yield loss.

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