The strong blue and red electroluminescence from Eu-implanted SiO2 layers were investigated as a function of implantation and annealing conditions. It is shown that the red electroluminescence assigned to Eu3+ ions is favored by low Eu concentrations, low annealing temperatures, and short annealing times. Based on a more quantitative analysis of the electroluminescence spectra this preference is explained by a shorter supply of oxygen for higher Eu concentrations and the growth of Europium or Europium oxide clusters with increasing annealing temperatures and annealing times. The correlation between electroluminescence and microstructure is supported by transmission electron microscopy investigations and demonstrates that the electroluminescence of Eu-implanted SiO2 layers can serve as a probe for the microstructural development in the active layer of the light emitter.

The effect of rare-earth clustering in dielectric media on the electroluminescence (EL) intensity, the charge trapping and the EL quenching was investigated using the example of Tb and Eu-implanted SiO2 layers. It was shown that the increase in the REOX cluster size induced by an increase in the furnace annealing temperature resulted in an increase in the concentration of electron traps with capture cross sections from 2×10−15 to 2×10−18 cm2. This is probably associated with an increase in the concentration of oxygen deficiency centers as well as with strained and dangling bonds in the SiO2 matrix which leads to an enhanced scattering of hot electrons and a decrease in the excitation cross section of the main EL lines of RE3+ ions. For the main EL lines of Tb3+ and Eu3+ ions the relation of the EL quenching to negative and positive charge generation in the SiO2 was considered. It was demonstrated that in case of REOX nanoclusters with small sizes (up to 5 nm) the EL quenching process can mainly be explained by a defect shell model which suggests the formation of negatively charged defect shells around the nanoclusters leading to a Coulomb repulsion of hot electrons and a suppression of the RE3+ excitation. At high levels of the injected charge (more than 2×1020 e/cm2) a second stage of the EL quenching was observed which was contributed to a positive charge accumulation in the SiO2 at a distance beyond the tunneling distance from the SiO2Si interface. In case of Eu-implanted SiO2 the quenching of the main EL line of Eu3+ is mostly correlated with positive charge trapping in the bulk of the dielectric. A model of EL quenching of the main Eu3+ line is proposed.

Control of the morphology of self-organized nanostructures is the key issue in bottom-up approaches. Here, morphological transitions of precipitation patterns in C:Cu nanocomposite films are studied. The films have been grown by oblique incidence ionized physical vapor deposition. We show that the ion energy and directionality are transferred into the C–Cu phase separation process resulting in nanopattern formation and tilt. Increasing metal content induces the “tilted”-“lying” transition accompanied with Cu nanoparticle prolate-spherical-oblate shape transformations. The results allow the identification of metal subplantation as the key atomistic mechanism, and demonstrate the possibility to achieve nanoscale sculpting via energetic ion deposition.

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