We study the self-organized ordering of nanostructures produced by ion-beam sputtering of targets amorphizing under irradiation. By introducing a model akin to models of pattern formation in aeolian sand dunes, we extend consistently the current continuum theory of erosion by IBS. We obtain new nonlinear effects responsible for the in-plane ordering of the structures, whose strength correlates with the degree of ordering found in experiments. Our results highlight the importance of redeposition and surface viscous flow to this nanopattern formation process.

No abstract

We report on the production of ordered assemblies of silicon nanostructures by means of irradiation of a Si(100) substrate with 1.2 keV Ar ions at normal incidence. Atomic Force and High-Resolution Transmission Electron microscopies show that the silicon structures are crystalline, display homogeneous height, and spontaneously arrange into short-range hexagonal ordering. Under prolonged irradiation (up to 16 hours) all dot characteristics remain largely unchanged and a small corrugation develops at long wavelengths. We interpret the formation of the dots as a result of an instability due to the sputtering yield dependence on the local surface curvatureComment: 4 two-column pages (revtex4), 3 figures (higher quality copies in the printed jrnl. version

No abstract

A lack of universality with respect to ion species has been recently established in nanostructuring of semiconductor surfaces by low-energy ion-beam bombardment. This variability affects basic properties of the pattern formation process, like the critical incidence angle for pattern formation, and has remained unaccounted for. Here, we show that nonuniform generation of stress across the damaged amorphous layer induced by the irradiation is a key factor behind the range of experimental observations, as the form of the stress field is controlled by the ion/target combination. This effect acts in synergy with the nontrivial evolution of the amorphous-crystalline interface. We reach these conclusions by contrasting a multiscale theoretical approach, which combines molecular dynamics and a continuum viscous flow model, with experiments using Xe + and Ar + ions on a Si(100) target. Our general approach can apply to a variety of semiconductor systems and conditions.

Ion-beam sputtering (IBS) is known to produce surface nanopatterns over macroscopic areas on a wide range of materials. However, in spite of the technological potential of this route to nanostructuring, the physical process by which these surfaces self-organize remains poorly understood. We have performed detailed experiments of IBS on Si substrates that validate dynamical and morphological predictions from a hydrodynamic description of the phenomenon. We introduce a systematic approach to perform the experiments under conditions that guarantee the applicability of a linear description, helping to clarify the experimental framework in which theories should be tested. Among our results, the pattern wavelength is experimentally seen to depend almost linearly on ion energy, in agreement with existing results for other targets that are amorphous or become so under irradiation. Our work substantiates flow of a nanoscopically thin and highly viscous surface layer, driven by the stress created by the ion beam, as an accurate description of this class of systems.

We report on the selective production of self-organized nanohole and nanodot patterns on Si(001) surfaces by ion beam sputtering (IBS) under normal-incidence of 1 keV Ar(+) ions extracted with a cold cathode ion source. For a fixed ion fluence, nanohole patterns are induced for relatively low ion current densities (50-110 µA cm(-2)), evolving towards nanodot patterns for current densities above 190 µA cm(-2). Both patterns display similar characteristics in terms of wavelength, short-range hexagonal order and roughness. Rutherford backscattering spectrometry measurements show that the surface morphology is tuned by the incorporation of metals coming from the ion source and sample surroundings during the IBS process. The metal content measured in nanohole patterns is almost twice that found in nanodot morphologies. Thus, the pattern morphology results from the balance between the dependences of the erosion rate on the ion flux, the local surface topography and composition. These nanostructures have promising applications as growth templates for preferential growth on either hillocks or cavities.

We report the experimental observation of interrupted coarsening for surface self organized nano structuring by ion erosion. Analysis of the target surface by atomic force microscopy allows us to describe quantitatively this intriguing type of pattern dynamics through a continuum equation put forward in different contexts across a wide range of length scales. The ensuing predictions can thus be consistently extended to other experimental conditions in our system. Our results illustrate the occurrence of nonequilibrium systems in which pattern formation, coarsening, and kinetic roughening appear, each of these behaviors being associated with its own spatiotemporal range.