Resonant photothermal bending spectroscopy (RPBS) at various measurement temperatures has been developed for estimating absorption coefficient (α) spectra of thin film semiconductors. The experimentally obtained sensitivity of RPBS was about ten times larger than nonresonant PBS. In vacuum, this technique has been applied to estimate the α spectrum of hydrogenated microcrystalline silicon (μc-Si:H) films at the measurement temperatures from 25 to 150 °C. It is demonstrated that the temperature coefficient of an indirect optical absorption at 1.2–1.8 eV caused by Si microcrystallite is almost the same as that of single crystalline silicon, and the temperature coefficient of below-gap absorption intensity is negative. The reason for the negative temperature coefficient and the energy level of the localized state resulting in the below gap absorption are discussed.
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