This letter reports the implementation of double-drift-layer (DDL) design into GaN vertical Schottky barrier diodes (SBDs) grown on free-standing GaN substrates. This design balances the trade-off between desirable forward turn-on characteristics and high reverse breakdown capability, providing optimal overall device performances for power switching applications. With a wellcontrolled metalorganic chemical vapor deposition process, the doping concentration of the top drift layer was reduced, which served to suppress the peak electric field at the metal/GaN interface and increase the breakdown voltages of the SBDs. The bottom drift layer was moderately doped to achieve low on-resistance to reduce power losses. At forward bias, the devices exhibited a record low turn-on voltage of 0.59 V, an ultra-low on-resistance of 1.65 mX cm 2 , a near unity ideality factor of 1.04, a high on/off ratio of $10 10 , and a high electron mobility of 1045.2 cm 2 /(V s). Detailed comparisons with conventional single-drift-layer (SDL) GaN vertical SBDs indicated that DDL design did not degrade the forward characteristics of the SBDs. At reverse bias, breakdown voltages of the DDL GaN SBDs were considerably enhanced compared to those of the conventional SDL devices. These results showed that GaN vertical SBDs with DDL designs are promising candidates for high efficiency, high voltage, high frequency power switching applications.
In this paper, we perform a comprehensive study on energy band engineering of InGaN multi-quantum-well (MQW) solar cells using AlGaN electron- and hole-blocking layers. InGaN MQW solar cells with AlGaN layers were grown by metalorganic chemical vapor deposition, and high crystal quality was confirmed by high resolution X-ray diffraction measurements. Time-resolved photoluminescence results showed that the carrier lifetime on the solar cells with AlGaN layers increased by more than 40% compared to that on the reference samples, indicating greatly improved carrier collections. The illuminated current-density (J–V) measurements further confirmed that the short-circuit current density (Jsc) of the solar cells also benefited from the AlGaN layer design and increased 46%. At room temperature, the InGaN solar cells with AlGaN layers showed much higher power conversion efficiency (PCE), by up to two-fold, compared to reference devices. At high temperatures, these solar cells with AlGaN layers also delivered superior photovoltaic (PV) performance such as PCE, Jsc, and fill factor than the reference devices. These results indicate that band engineering with AlGaN layers in the InGaN MQW solar cell structures can effectively enhance the carrier collection process and is a promising design for high efficiency InGaN solar cells for both room temperature and high temperature PV applications.
We report, for the first time, the characterizations on optical nonlinearities of beta-phase gallium oxide (β-GaO), where both (010) β-GaO and (2¯01) β-GaO were examined for two-photon absorption coefficient, Kerr nonlinear refractive index, and their polarization dependence. The wavelength dependence of two-photo absorption coefficient and Kerr nonlinear refractive index were also estimated by a widely used analytical model. β-GaO exhibits a two photon absorption (TPA) coefficient of 1.2 cm/GW for (010) β-GaO and 0.6 cm/GW for (2¯01) β-GaO. The Kerr nonlinear refractive index is -2.1 × 10 cm/W for (010) β-GaO and -2.9 × 10 cm/W for (2¯01) β-GaO. In addition, β-GaO shows stronger in-plane nonlinear optical anisotropy on (2¯01) plane than on (010) plane. Compared with GaN, TPA coefficient of β-GaO is 20 times smaller, and the Kerr nonlinear refractive index of β-GaO is also found to be 4-5 times smaller. These results indicate that β-GaO have the potential for ultra-low loss waveguides and ultra-stable resonators and integrated photonics, especially in UV and visible wavelength spectral range.
To mimic selective-area doping, p-GaN was regrown on an etched GaN surface on GaN substrates by metalorganic chemical vapor deposition. Vertical GaN-on-GaN p-n diodes were fabricated to investigate the effects of the etch-then-regrowth process on device performance. The crystal quality of the sample after each epitaxial step was characterized by X-ray diffraction, where the etch-then-regrowth process led to a very slight increase in edge dislocations. A regrowth interfacial layer was clearly shown by transmission electron microscopy. Strong electroluminescence was observed with three emission peaks at 2.2 eV, 2.8 eV, and 3.0 eV. The forward current density increased slightly with increasing temperature, while the reverse current density was almost temperature independent indicating tunneling as the reverse transport mechanism. This result is very similar to the reported Zener tunnel diode comprising a high doping profile at the junction interface. High levels of silicon and oxygen concentrations were observed at the regrowth interface with a distribution width of ∼100 nm. This work provides valuable information on p-GaN regrowth and regrown GaN p-n diodes, which can serve as an important reference for developing selective doping for advanced GaN power electronics for high voltage and high power applications.
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