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The misfolding and subsequent assembly of proteins and peptides into insoluble amyloid structures play important roles in the development of numerous diseases. The dynamics of self-assembly and the morphology of the resulting aggregates critically depend on various environmental factors and especially on the presence of interfaces. Here, we show in detail how the presence of surfaces with different physicochemical properties influences the assembly dynamics and especially the aggregate morphology of hIAPP(20-29), an amyloidogenic fragment of the peptide hormone human islet amyloid polypeptide (hIAPP), which is involved in the development of type 2 diabetes. Time-lapse atomic force microscopy is employed to study the assembly dynamics of hIAPP(20-29) and the morphology of the resulting aggregates in bulk solution as well as at hydrophilic and hydrophobic model surfaces. We find that the presence of hydrophilic mica surfaces promotes fibrillation when compared with the assembly in bulk solution and results in a more pronounced polymorphism. Three fibrillar species are found to coexist on the mica surface, that is, straight, coiled, and ribbon-like fibrils, whereas only the straight and coiled fibrils are observed in bulk solution after comparable incubation times. In addition, the straight and coiled fibrils assembled at the mica surface have significantly different dimensions compared with those assembled in bulk solution. The three fibrillar species found on the mica surface most likely form independently by lateral association of arbitrary numbers of protofibrils with about 2 nm height. On hydrophobic hydrocarbon surfaces, fibrillation is retarded but not completely suppressed, in contrast to previous observations for full-length hIAPP(1-37). Our results show that peptide-surface interactions may induce diverse, peptide-specific alterations of amyloid assembly dynamics and fibrillar polymorphism. They may therefore contribute to a deeper understanding of the molecular processes that govern amyloid aggregation at different surfaces.

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Identification and synthesis of intramolecularly donor-stabilized aluminium(III) complexes, which contain a 3-(dimethylamino)propyl (DMP) ligand, as novel atomic layer deposition (ALD) precursors has enabled the development of new and promising ALD processes for Al O thin films at low temperatures. Key for this promising outcome is the nature of the ligand combination that leads to heteroleptic Al complexes encompassing optimal volatility, thermal stability and reactivity. The first ever example of the application of this family of Al precursors for ALD is reported here. The process shows typical ALD like growth characteristics yielding homogeneous, smooth and high purity Al O thin films that are comparable to Al O layers grown by well-established, but highly pyrophoric, trimethylaluminium (TMA)-based ALD processes. This is a significant development based on the fact that these compounds are non-pyrophoric in nature and therefore should be considered as an alternative to the industrial TMA-based Al O ALD process used in many technological fields of application.

Vapor phase deposited iron oxide nanostructures are promising for fabrication of solid state chemical sensors, photoelectrodes for solar water splitting, batteries, and logic devices. The deposition of iron oxide via chemical vapor deposition (CVD) or atomic layer deposition (ALD) under mild conditions necessitates a precursor that comprises good volatility, stability, and reactivity. Here, a versatile iron precursor, namely [bis(N‐isopropylketoiminate) iron(II)], which possesses ideal characteristics both for low‐temperature CVD and water‐assisted ALD processes, is reported. The films are thoroughly investigated toward phase, composition, and morphology. As‐deposited ALD grown Fe2O3 layers are amorphous, while the CVD process in the presence of oxygen leads to polycrystalline hematite layers. The nanostructured iron oxide grown via CVD consists of nanoplatelets that are appealing for photoelectrochemical applications. Preliminary tests of the photoelectrocatalytic activity of CVD‐grown Fe2O3 layers show photocurrent densities up to 0.3 mA cm−2 at 1.2 V versus reversible hydrogen electrode (RHE) and 1.2 mA cm−2 at 1.6 V versus RHE under simulated sunlight (1 sun). Surface modification by cobalt oxyhydroxide (Co‐Pi) co‐catalyst is found to have a highly beneficial effect on photocurrent, leading to maximum monochromatic quantum efficiencies of 10% at 400 nm and 4% at 500 nm at 1.5 V versus RHE.

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A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.

Atomic oxygen densities and fluences in a microwave plasma are determined by means of optical emission spectroscopy for different oxygen to hexamethyldisiloxane (HMDSO) ratios during deposition of SiO x and SiO x C y H z like coatings on molecularly defined organic surfaces. The plasma coatings are deposited on octadecanethiol self-assembled monolayers that serve as a sensor layer. They are used for tracing the interfacial changes induced during plasma deposition as a function of the O 2 to HMDSO ratio and absolutely quantified atomic oxygen fluence. The interfacial chemical changes are monitored by means of polarization modulation IR reflection-absorption spectroscopy. The data reveal that significant oxidative degradation of the sensor layer is reached for exposure to an atomic oxygen fluence of 1.0 Á 10 22 m À2 .