In this work, the structural and optical properties of V2O5 have been presented. Thin films were manufactured by the RF magnetron sputtering process. The nanostructures and some optical properties  of deposit thin films at different sputtering RF power in a plasma chamber were investigated. The structural investigation was performed with  X-Ray Diffraction (XRD) measurements and Atomic Force Microscopy (AFM). The results obtained from both methods have revealed that as-deposited films were polycrystalline in nature. The texture of the films was observed  that , the crystallite and  grain size were increased with increasing the sputtering power. Optical properties were determined by transmission measurements in the spectral range from (250 to 1100 nm) . An Optical energy gap of sputtered films and its dependency to sputtering power of plasma have been measured. It was found that the energy gap decreased with increasing the  used power. The energy band gap was found to be in the ranged of (3.02 eV to 2.90 eV) when the sputtering power varying from (75 nm to 150 Watt).

The increase demand for electric power, high consumption and little power station capacity has caused to reduce supplying hours of electricity in Iraq. Furthermore high bills prices especially in rural areas and cities faraway from electricity-generating power stations. In addition to the increase in pollution due to the use of fossil fuel sources. All those obstacles have led to the search for cheap, clean and renewable energy sources. In this research, wind turbine model operates at a low wind speed and high efficiency was achieved. The model was located and studied in Tikrit city where wind power need to be consumed. Here, the vertical turbine with an area of 0.49 m2 was designed and then it was placed at least 8 meters above the ground without any disturbances within 100 meters in any direction. The system was observed to start rotating with wind speed of 1.5 m/s. However, the best turbine cycles per minute were 68 was obtained at wind speed of 6.6 m/s and the system torque was 60 N.m. Finally, 75 watts of power was produced from a multipurpose generator that was designed to run a single battery. and was used (Neodymium magnet), and also operated at low speed.

The V2O5 films were deposited on glass substrates which produce using "radio frequency (RF)"power supply and Argon gas technique. The optical properties were investigated by, UV spectroscopy at "radio frequency" (RF) power ranging from 75 - 150 Watt and gas pressure, (0.03, 0.05 and 0.007 Torr), and substrate temperature (359, 373,473 and 573) K. The UV-Visible analysis shows that the average transmittance of all films in the range 40-65 %. When the thickness has been increased the transhumance was decreased from (65-40) %. The values of energy band gap were lowered from (3.02-2.9 eV) with the increase of thickness the films in relation to an increase in power, The energy gap decreased (2.8 - 2.7) eV with an increase in the pressure and substrate temperature respectively.

In this paper, we investigate the basic characteristics of “magnetron sputtering plasma” using the target V2O5. The “magnetron sputtering plasma” is produced using “radio frequency (RF)” power supply and Argon gas. The intensity of the light emission from atoms and radicals in the plasma measured by using “optical emission spectrophotometer”, and the appeared peaks in all patterns match the standard lines from NIST database and employed are to estimate the plasma parameters, of computes electron temperature and the electron density. The characteristics of V2O5 sputtering plasma at multiple discharge provisos are studied at the “radio frequency” (RF) power ranging from 75 - 150 Watt and gas pressure (0.1, 0.08) mbar. One can observe that the intensity of the emission lines increases with increasing the sputtering power. We find that the electron temperature excess drastically from 0.95 eV to 1.11eV when the emptying gas pressure excess of 0.1 to 0.08 mbar. On the other hand the excess electron temperature from 0.9 to 1.01 eV with increasing sputtering power from 100 to 125 Watt, while the electron density decrease from 5.9×1014 to 4.5×1014 cm−3 with increasing sputtering power. and electron density decrease with increasing of pressure from 4.25×1014 to 2.80×1014 cm−3, But the electron density maximum values 5.9×1014 at pressure 0.08 mbar.

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