The mechanism and kinetics of undoped and doped CdTe dissolution in aqueous H 2 O 2 -HBr-ethylene glycol mixtures are investigated. The results are used to construct the dissolution rate-etchant composition diagrams for the materials studied and to identify the rate-limiting step of the dissolution process. Dissolution in polishing etchants is shown to be diffusion-limited. Doping has a significant effect on the dissolution behavior of CdTe.
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