We accomplished truly scalable, low cost, arbitrarily large-area block copolymer lithography, synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly. Graphoepitaxy morphology composed of highly aligned lamellar block copolymer film that self-assembled within a disposable photoresist trench pattern was prepared by conventional I-line lithography and utilized as a chemical nanopatterning mask for the underlying substrate. After the block copolymer film and disposable photoresist layer were removed, the same lamellar block copolymer film was epitaxially assembled on the exposed chemically patterned substrate. Highly oriented lamellar morphology was attained without any trace of structure directing the photoresist pattern over an arbitrarily large area.
Reflective color filters using two-dimensional photonic crystals based on sub-wavelength gratings were proposed and constructed. Using low-cost nanoimprint lithography, an amorphous silicon layer was deposited through the low-temperature PECVD process and patterned into two-dimensional structures. The isolated amorphous silicon patterns were readily crystallized using a multi-shot excimer laser annealing at low energy. A study of the close relationship between color filter reflectance and silicon pattern crystallinity is introduced. Theoretical and experimental results show that the proposed color filters have high reflectance and, moreover, decrease the dependence on incident angle compared to one-dimensional photonic crystal color filters.
A reflective color filter based on a two-dimensional subwavelength grating is proposed. The filter has been designed by performing numerical simulations and has been fabricated on 5×5 mm2 quartz glass using electron beam lithography. The grating color filter shows reflectance of 74% and spectral width of about 80 nm. Furthermore, it has good angular tolerance, up to ±45°, for unpolarized incident light. By analyzing the reflectance spectral distributions in the band diagram, we found that high angular tolerance is achieved due to the high refractive index contrast of grating structures.
We propose a method to control the pretilt angle of liquid crystals by employing a mixture of the vertical alignment polyimide and the liquid crystalline prepolymer (LCP). The pretilt angle between 10° and 90° can be controlled continuously by changing the mixing ratio of the LCP. Multidomains with different pretilt angles can be formed because the pretilt angle between 50° and 90° can be obtained by varying the UV exposure time region by region under a fixed mixing ratio. We confirmed experimentally that proposed alignment layers are thermally stable.
We have improved a white color balance using multi‐grating period structure in the holographic backlight units that can be applicable to mobile LCD panel where several LEDs are placed at edge of guide plate as light sources. New H‐LGP is based on the characteristics of grating and its diffraction angle can be determined by specific grating period. With this idea, hologram backlight unit can realize not only lower weight and less power consumption but also higher light utilization by eliminating couple of prismatic sheets which have been widely used in conventional unit inevitably.
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