A new class of compounds which are non-ionic and halogen-free photo acid generators applicable for g-line, i-line and DUV photoresists is reported. The compounds exhibit high solubility in PGMEA, thermal stability in a phenolic polymer matrix up to l40 °C, storage stability below 40 °C more than 1 year, red-shifted absorption profile reaching to 490 nm, effective acid generation in terms of quantum yield and high sensitivity in resist formulations with various exposure wavelength.An application example of the new photoacid generator for chemically amplified negative resist is presented.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.