Transparent, photochromic, and X-ray shielding polymer films were obtained by bulk radical copolymerization of bismuth(III) methacrylate (BiMA), easily synthesized from Ph 3 Bi and methacrylic acid, and N,N-dimethylacrylamide (DMAA). The refractive indices and X-ray shielding abilities were increased as the increase of the bismuth content. The photochromism, coloring by UV irradiation and discoloring under ambient conditions, occurs by reversible redox between the bismuth carboxylate structure and Bi(0). The facile preparation procedure using inexpensive substances is an advantage over those of previously reported bismuth-containing polymers.
Highly
refractive and X-ray shielding polymer films were prepared
by bulk radical copolymerization of diphenylstyrylbismuthine (MStBi)
with tristyrylbismuthine (TStBi). For example, a yellow transparent
film was obtained by copolymerization of MStBi and TStBi in a ratio
of 70:30 (w/w). The refractive index (n
D) and radiopacity of the film of these polymers are 1.72 and 1.60
μm-Al/μm-polymer, respectively. These properties are higher
than those of the reported bismuth-containing polymers. The thermal
stability and flexural module of the polymer films were controllable
by the feed ratio of TStBi. The polymer films also exhibited high
surface hardness and solvent resistance due to the rigid and cross-linked
structure. The chemical and thermal stability and higher refractive
index and radiopacity of the polymers suggest the potential applications
for X-ray shielding of optical materials with high refractive indices.
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