Chromium magnesium oxynitride ((Cr,Mg)(N,O)) thin films have been prepared by
pulsed laser deposition (PLD) method with changing the surface area ratio of Mg target (SR) from 0
to 100 %. As a result of the analysis by energy dispersive X-ray spectroscopy (EDX), it was found
that magnesium content in the total metallic elements (Cr1-x, Mgx) are controlled by changing SR
from 0 to 100 % to be the x ranging from 0 to 1.0. Since the crystal structure of main phase in all
thin films was found to be NaCl type, the XRD results showed that the thin films were mainly
consisted of (Cr,Mg)(N,O). The hardness of (Cr,Mg)(N,O) thin films were increased almost linearly
up to SR = 50 %, above which it decreases rapidly. The maximum Vickers hardness (HV) of 3600
was obtained for the thin film which was prepared by SR = 50 %, and the minimum HV of 1650 was
obtained for the thin film which was prepared by SR = 100 %.
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