Three isomers of yttrium carbide (Y 2 C 2 ) endohedral metallofullerenes, i.e., (Y 2 C 2 )@C 82 (I, II, III), have been synthesized and chromatographically isolated for the first time. The structures of (Y 2 C 2 )@C 82 (I, II, III) metallofullerenes have been characterized by 13 C NMR measurements, whose molecular symmetries have been determined to be C s , C 2V , and C 3V , respectively. In addition, a pure diyttrium metallofullerene, Y 2 @C 82 (III), has also been synthesized and structurally characterized. The 13 C NMR structural analyses indicate that (Y 2 C 2 )@C 82 (III) has exactly the same fullerene cage as that of Y 2 @C 82 (III). On the basis of the results, we propose a C 2 -trapping and loss of growth mechanism of dimetallofullerenes of (M 2 C 2 )@C 82 and M 2 @C 82 from M 2 @C 84 , respectively.
A synthetic route to enantiomerically pure (1R,2S)-1-phenylphospholane-2-carboxylic acid (1), which is a phosphorus analogue of proline, has been established. A key step is the deprotonation-carboxylation of the 1-phenylphospholane borane complex 3 by using sBuLi/1,2-dipiperidinoethane (DPE). Configurational stability of the key intermediate, the amine-coordinated alpha-phosphinoalkyllithium borane complex 4, was investigated by employing lithiodestannylation-carboxylation of both diastereomers of the 1-phenyl-2-trimethylstannylphospholane borane complex 7 in the presence of several kinds of amines, and as a result, 4 was found to be configurationally labile even at -100 degrees C. The key intermediate, the DPE-coordinated trans-1-phenyl-2-phospholanyllithium borane complex 9, was isolated, and the structure was identified by X-ray crystal structure analysis. This is the first X-ray crystal structure determined for an alpha-monophosphinoalkyllithium borane complex. Remarkably, the alkyllithium complex is monomeric and tricoordinate at the lithium center with a slightly pyramidalized environment, and the existence of a Li--C bond (2.170 A) has been confirmed. Moreover, (1)H-(7)Li HOESY and (6)Li NMR analyses suggested the structure of 9 in solution as well as the existence of an equilibrium between 9, its cis isomer, and the ion pair 8 at room temperature, which was extremely biased towards 9 at -100 degrees C. Finally, 1 was used as a chiral ligand in a palladium-catalyzed allylic substitution, and the desired product was obtained in high yield with good enantioselectivity.
Etch performances of inductory-coupled plasma (ICP) metal etchers with several gas systems are examined under constant ion energy condition to evaluate extendibility to the 300 mm wafer magnetic tunnel junction (MTJ) etch process. The ICP-Ar sputter etch affects little on magnetic properties, and shows about the same magnetoresistive (MR) ratio with conventional Ar ion milling. Major issue is the electrical short by redeposition. The etch uniformity over the wafer and precise etch end-point detection are important. The Cl2 addition to the ICP-Ar etch plasma shows serious pattern deformation and degradation of loop offset (H
off). Methanol (Me-OH) etch shows slightly lower MR-ratio due to material degradation. However, better H
off is observed probably due to the ion protection effect by thin carbon layer over the etched surface. Dilution of Me-OH with Ar improves MR ratio. Ar/Me-OH and ICP-Ar etch processes would be the candidate for 300 mm process at present.
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