The emerging organic-inorganic metal halide perovskite materials have been the focus 3 of the optoelectronic research community owing to their excellent photoelectric 4 properties. Nevertheless, there still exist challenges for transferring the lab-made 5 devices to large-area industrial modules. Inkjet printing (IJP) technology provides a 6 promising way to fill the gap because of its precise droplet control and uniform large-7 scale deposition functions. Hence, an in-depth understanding of inkjet-printed 8 perovskite films from the aspects of droplet manipulation and crystallization regulation 9 is critical for upscaling the perovskite devices to commercial usage. In this review, we 10 give an overview on the inkjet-printed high-quality perovskite films, and provide 11 guidelines on inkjet-printing large-scale high-performance perovskite devices. First, we 12 analyze theories of droplet formation and perovskite nucleation/crystallization 13 dynamics, and then focus on summarizing the perovskite film-formation strategies via 14 IJP, in the aspect of ink engineering, printing process and post treatment. Furthermore, 15 we review the recent advances of inkjet-printed perovskite films on optoelectronic 16 devices such as perovskite solar cells (PSCs), perovskite light-emitting diodes (PeLEDs) 17 and perovskite photodetectors (PDs). Finally, we propose the challenges on how to 18 obtain high-quality inkjet-printed perovskite films, and highlight the "Trilogy 19 Strategies" of printing high-quality perovskite films aiming for high-performance 20 optoelectronic devices.
Figure 4. a) AVT (black lines) and negative-related J SC (red lines) for a 6 nm thick gold device. The effect of including a 100 nm LiF capping layer is illustrated (dashed lines). Such a capping layer modifies the field distribution inside the device, which affects the average reflected sunlight. Reproduced with permission. [60] Copyright 2014, Royal Society of Chemistry. b) Device architecture of the cells with conducting polymer PEDOT:PSS as the top electrode. Reproduced with permission. [64] Copyright 2016, American Chemical Society. c) Schematics of possible incident light paths within PSCs with the textured substrate. Reproduced with permission. [68] Copyright 2017, Elsevier B.V. All rights reserved. d) CIE1960 color space used to calculate CRI with test color samples (TCS01-TCS08) and PV devices 1-8. Comparison of objects illuminated by high and low CRI light source (left): under low CRI conditions. CIELAB color space (right): the dashed box illustrates the region of acceptable tinting for many mass-market architectural glass products. Reproduced with permission. [69] Copyright 2019, Elsevier Inc. e) Photographs of 3D TiO 2 /MAPb(I 1−x Br x ) 3 bilayer nanocomposites on FTO glass substrates. Reproduced with permission. [26] Copyright 2013, American Chemical Society. f) Color coordinates of the devices (device structure: FTO/t-TiO 2 /perovskite) under AM1.5 illumination on the CIE xy1931 chromaticity diagram and the enlarged central region. Reproduced with permission. [71]
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