The phenomenon of magnetic resonance and its detection via microwave spectroscopy provide insight into the magnetization dynamics of bulk or thin film materials. This allows for direct access to fundamental properties, such as the effective magnetization, g-factor, magnetic anisotropy, and the various damping (relaxation) channels that govern the decay of magnetic excitations. Cavity-based and broadband ferromagnetic resonance techniques that detect the microwave absorption of spin systems require a minimum magnetic volume to obtain a sufficient signal-to-noise ratio (S/N). Therefore, conventional techniques typically do not offer the sensitivity to detect individual micro- or nanostructures. A solution to this sensitivity problem is the so-called planar microresonator, which is able to detect even the small absorption signals of magnetic nanostructures, including spin-wave or edge resonance modes. As an example, we describe the microresonator-based detection of spin-wave modes within microscopic strips of ferromagnetic A2 Fe60Al40 that are imprinted into a paramagnetic B2 Fe60Al40-matrix via focused ion-beam irradiation. While microresonators operate at a fixed microwave frequency, a reliable quantification of the key magnetic parameters like the g-factor or spin relaxation times requires investigations within a broad range of frequencies. Furthermore, we introduce and describe the step from microresonators towards a broadband microantenna approach. Broadband magnetic resonance experiments on single nanostructured magnetic objects in a frequency range of 2–18 GHz are demonstrated. The broadband approach has been employed to explore the influence of lateral structuring on the magnetization dynamics of a Permalloy (Ni80Fe20) microstrip.
Phase transitions occurring within spatially confined regions can be useful for generating nanoscale material property modulations. Here we describe a magneto-structural phase transition in a binary alloy, where a structural transition from short-range order (SRO) to body centered cubic (bcc) results in the formation of depth-adjustable ferromagnetic layers, which reveal application-relevant magnetic properties of high saturation magnetization (M s) and low Gilbert damping (α). Here we use Fe60V40 binary alloy films which transform from initially M s = 17 kA/m (SRO structure) to 747 kA/m (bcc structure) driven by atomic displacements caused by penetrating ions. Simulations show that an estimated ∼1 displacement per atom triggers a structural transition, forming homogeneous ferromagnetic layers. The thickness of a ferromagnetic layer increases as a step-like function of the ion fluence. Microwave excitations of the ferromagnetic/non-ferromagnetic layered system reveals an α = 0.0027 ± 0.0001. The combination of nanoscale spatial confinement, low α, and high M s provides a pathway for the rapid patterning of magnetic and microwave device elements.
The ferromagnetic resonance of a disordered A2 Fe60Al40 ferromagnetic stripe, of dimensions 5 µm × 1 µm × 32 nm, has been observed in two vastly differing surroundings: in the first case, the ferromagnetic region was surrounded by ordered B2 Fe60Al40, and in the second case it was free standing, adhering only to the oxide substrate. The embedded ferromagnet possesses a periodic magnetic domain structure, which transforms to a single domain structure in the freestanding case. The two cases differ in their dynamic response, for instance, the resonance field for the uniform (k = 0) mode at ~ 14 GHz excitation displays a shift from 209 to 194 mT, respectively for the embedded and freestanding cases, with the external magnetic field applied along the long axis. The resonant behavior of a microscopic ferromagnet can thus be finely tailored via control of its near-interfacial surrounding.
Similar to electrical currents flowing through magnetic multilayers, thermal gradients applied across the barrier of a magnetic tunnel junction may induce pure spin-currents and generate ‘thermal’ spin-transfer torques large enough to induce magnetization dynamics in the free layer. In this study, we describe a novel experimental approach to observe spin-transfer torques induced by thermal gradients in magnetic multilayers by studying their ferromagnetic resonance response in microwave cavities. Utilizing this approach allows for measuring the magnetization dynamics on micron/nano-sized samples in open-circuit conditions, i.e. without the need of electrical contacts. We performed first experiments on magnetic tunnel junctions patterned into 6 × 9 µm2 ellipses from Co2FeAl/MgO/CoFeB stacks. We conducted microresonator ferromagnetic resonance (FMR) under focused laser illumination to induce thermal gradients in the layer stack and compared them to measurements in which the sample was globally heated from the backside of the substrate. Moreover, we carried out broadband FMR measurements under global heating conditions on the same extended films the microstructures were later on prepared from. The results clearly demonstrate the effect of thermal spin-torque on the FMR response and thus show that the microresonator approach is well suited to investigate thermal spin-transfer-driven processes for small temperatures gradients, far below the gradients required for magnetic switching.
Interfaces separating ferromagnetic (FM) layers from non-ferromagnetic layers offer unique properties due to spin-orbit coupling and symmetry breaking, yielding effects such as exchange bias, perpendicular magnetic anisotropy, spin-pumping, spin-transfer torques, conversion between charge and spin currents and vice-versa. These interfacial phenomena play crucial roles for magnetic data storage and transfer applications, which require forming FM nano-structures embedded in non-ferromagnetic matrices. Here, we investigate the possiblity of creating such nano-structures by ion-irradiation. We study the effect of lateral confinement on the ion-irradiation-induced reduction of nonmagnetic metal oxides (e.g., antiferro-or paramagnetic) to form ferromagnetic metals.Our findings are later exploited to form 3-dimensional magnetic interfaces between Co, CoO and Pt by spatially-selective irradiation of CoO/Pt multilayers. We demonstrate that the mechanical displacement of the O atoms plays a crucial role during the reduction from insulating, non-ferromagnetic cobalt oxides to metallic cobalt. Metallic cobalt yields both perpendicular magnetic anisotropy in the generated Co/Pt nano-structures, and, at low temperatures, exchange bias at vertical interfaces between Co and CoO.If pushed to the limit of ion-irradiation technology, this approach could, in principle, enable the creation of densely-packed, atomic scale ferromagnetic point-contact spintorque oscillator (STO) networks, or conductive channels for current-confined-path based current perpendicular-to-plane giant magnetoresistance read-heads.
Metastability effects in hydrogenated microcrystalline silicon thin films due to air, high purity nitrogen, helium, argon, and oxygen were investigated using temperature-dependent dark conductivity, photoconductivity, and steady-state photocarrier grating methods. It was found that short-term air, nitrogen, and inert gases caused a small reversible increase of σDark and σphoto within a factor of two, but they did not affect the minority carrier μτ-products significantly. These changes are partially reduced by vacuum treatment and completely reduced after heat treatment at 430 K. However, oxygen gas treatment at 80 °C resulted in more than an order of magnitude increase in both σDark and σphoto and an increase in the diffusion length, LD, by 50% from that of the annealed-state value in highly crystalline samples, while no significant metastability is detected in amorphous and low crystalline silicon thin films. A following heat treatment partially recovers both σDark and σphoto to their annealed-state values, while LD decreases only slightly. Such increase in the LD values could be due to a decrease in the density of recombination centers for holes below the Fermi level, which may be related to passivation of defects by oxygen on the surface of crystalline grains.
Metastability and instability effects due to oxygen exposure in thick intrinsic hydrogenated microcrystalline silicon films deposited by very high frequency plasma enhanced chemical vapour deposition on smooth glass substrates were investigated using temperature-dependent dark conductivity, steady state photoconductivity, and sub-bandgap absorption measurements obtained using the dual beam photoconductivity (DBP) method. No significant changes in dark conductivity and photoconductivity were detected even after long-term air exposure of samples in room ambient as well as after oxygen exposure when samples were characterized in oxygen ambient. However, characterization of the oxygen-exposed state in high vacuum caused an increase in dark conductivity and photoconductivity as well as a significant decrease in the sub-bandgap absorption coefficient spectra in the low energy region in samples with I C RS Ͼ 0.40. These changes are partially irreversible for samples I C RS Ͼ 0.80 and mostly reversible for compact materials with significant amorphous fraction. No detectable metastable changes occurred in microcrystalline silicon samples with I C RS Ͻ 0.40 as well as in pure amorphous silicon.Résumé : Nous utilisons la conductivité en obscurité, la photoconductivité stationnaire et des mesures d'absorption sous la bande interdite obtenues de la méthode de photoconductivité à deux faisceaux (DBP), afin d'étudier les effets stables et métastables de l'exposition à l'oxygène de films de silicium microcristallins hydrogénés épais déposés par plasma à haute fréquence augmenté d'un dépôt de vapeur chimique sur un substrat de verre lisse. Nous ne détectons aucun changement de la conductivité en obscurité ni de la photoconductivité, même après une longue exposition à l'air à température ambiante, aussi bien qu'après exposition à l'oxygène où les échantillons sont examinés dans une atmosphère d'oxygène. Cependant, étudier sous vide les échantillons exposés à l'oxygène donne une augmentation de la conductivité en obscurité, aussi bien que de la photoconductivité, en même temps qu'une diminution significative de l'absorption sous la bande interdite dans les échantillons avec I C RS Ͼ 0.40. Ces changements sont partiellement réversibles pour les échantillons avec I C RS Ͼ 0.80 et majoritairement réversibles pour les matériaux compacts avec une fraction amorphe importante. Nous ne détectons aucun changement méta-stable dans les échantillons de silicium microcristallin avec I C RS Ͻ 0.40 ni dans le silicium complètement amorphe. [Traduit par la Rédaction]
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