Stepwise replacement of halogen in phosphorus trihalides has been effected by alkoxytrimethylsilanes, thus avoiding the presence of hydrogen halides or tertiary base. The 1-phenylethoxysilane afforded the dichloridite, but the tert.-butoxy-analogue gave only alkyl chloride. Replacement in the oxychloride proceeded to the dichloridate, and much more slowly to the chloridqe, and there was evidence of formation of n-butyl phosphorodibromidate from the oxybromide. Fission of the alkoxysilane occurred differently in the examples of the 1-phenylethyl and diphenylmethyl derivatives , the oxychloride affording alkyl chloride and trimethylsilyl phosphorodichloridate.REPLACEMENT of halogen in phosphorus trihalides and oxyhalides by the alkoxyl group has been effected by alkoxytrimethykilane under conditions in which the presence of a tertiary base and a hydrogen halide is avoided. Certain limitations have been observed. Thus stepwise replacement of halogen in the trichloride by alkoxyl was effected by n-butoxytrimethylsilane , giving the alkyl phosphorodichloridite, the dialkyl phosphorochloridite, and the trialkyl phosphite [scheme (l)] . n-, iso-, and sec.-Butyl phosphorodibromidites, and the corresponding bromidites were prepared from phosphorus tribromide. The halogenotrimethylsilane formed concurrently was readily separated and used for the preparation of further supplies of the alkoxysilane.
Spektren bestatigt, iiber die in Kurze berichtet wird. Durch Simulation konnte die Groflenordnung der Zwischenschichtkapazitat zu 10 yF/cm' bestimmt werden.
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