In this work, Cu x O thin films were obtained by air annealing of copper thin films deposited on glass substrates using thermal evaporation method by Glancing Angle Deposition "GLAD" technique. The copper was sculptured into a zigzag shape, which presents two columns with inclined angles + and-where is the deposition angle between the incident flux and the substrate normal. Morphological, structural, optical and electrical properties of the obtained thin films were investigated using X-ray diffraction (XRD), UV-Vis-NIR Spectroscopy and electrical resistivity measurements. The XRD patterns revealed that thin films deposited at different incident angles are mainly crystallized in Cu 2 O cubic phase characterized by the preferential orientation along (111) plane. The optical parameters were calculated from the analysis of the transmittance and reflectance spectra in the wavelength range 300-1800 nm. Theabsorptioncoefficient exceeds 10 5 cm-1 in the visible and NIR spectral ranges. Direct band gap energy increases from 2 to 2.54 eV with deposition angle. The in-plane birefringence and the anisotropic resistivity of the Cu 2 O films were also studied. Their maxima were obtained at incident flux angle of = 60°. Therefore, the GLAD technique is a promising way to create zigzag nanostructures with enhanced anisotropic properties.

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