Textured crystalline NiO thin films were grown on Si(100) substrates by off-axis RF magnetron sputtering without substrate heating using a NiO target. (100)-textured NiO films were obtained using pure Ar gas. On the other hand, (111)-textured NiO films were obtained using pure O2 gas. Also, the surface morphology and roughness of the NiO thin films were closely related to the type of sputtering gas and RF power.
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