Electro-codeposition of Ag:Au alloy combined with chemical etching Ag is a low-cost process for fabricating nanoporous Au-modified MEA suitable for establishing the stimulus-response relationship of cultured neuronal networks.

A multielectrode array (MEA) was fabricated with electrodes consisting of iridium oxide (IrOx) electrochemically deposited on nanoporous gold (NPG) to improve the moderate charge injection limit (ca. 1 mC cm) of NPG MEA. IrOx was electrodeposited by performing cyclic voltammetry with an IrOx deposition solution. The IrOx was electrodeposited on Au (EIROF/Au) and on NPG (EIROF/NPG) MEA, and the samples were analyzed in terms of the charge injection limit, charge storage capacity (CSC), and electrochemical impedance. The charge injection limit of the EIROF(100-cycled)/NPG MEA was estimated to be 2.3 mC cm by measuring the voltage transient, and this value is sufficiently greater than the neural damage threshold (ca. 1 mC cm) and is also comparable to that of sputtered IrOx films. Considering the low charge injection limit (<0.1 mC cm) for the EIROF(100-cycled)/Au MEA, the high charge injection limit for the EIROF/NPG MEA was explained to be a result of synergetic combination of the inherently large surface area of the NPG and electrically active EIROF. The EIROF(100-cycled)/NPG exhibited an impedance of 9.7 ± 0.45 kΩ at 1 kHz and a CSC of 8 mC/cm, respectively, obtained via electrochemical impedance spectroscopy and integration of the cathodic current in a cyclic voltammogram. Scanning transmission electron microscopy and energy-dispersive X-ray spectroscopy are used to conduct an elemental mapping analysis of the cross-sectional structure of the EIROF/NPG and revealed that the EIROF had been uniformly deposited on the surface of the interconnected Au. The efficacy of the improvement in the charge injection limit of the EIROF/NPG MEA was evaluated with rat hippocampal slices. The EIROF/NPG electrodes exhibited a steeper increase in the negative peak amplitude of the field excitatory postsynaptic potentials (fEPSPs), even with an electrical stimulation of a lower amplitude (1-4 V), prolonged negative fEPSPs wave after peak response, and decreased serial reduction of fEPSPs compared to NPG MEA, all of which strongly indicate an improved charge injection for the EIROF/NPG MEA over NPG MEA.

We describe photopatterning technique that employs the photodegradation of cell-adhesive-modified poly(ethyleneimine) (m-PEI) to fabricate precise micropatterns on the indium tin oxide (ITO) substrate for guided neuronal growth. The photodegradation of m-PEI coated on hydroxyl group-terminated ITO substrate created micropatterns over a large area through deep UV irradiation. The photopatterned m-PEI layer can effectively guide neurite outgrowth and control neurite extensions from individual neurons.

Transparent graphene-vertically aligned carbon nanotube (VACNT) electrodes enable the dual function of optical cell monitoring and cell electrical signal measurements with exceptionally high signal amplitude.

We report a bi-layer lift-off resist (LOR) technique in combination with sputter deposition of silicon dioxide (SiO2) as a new passivation method in the fabrication of a multi-electrode array (MEA). Using the photo-insensitive LOR as a sacrificial bottom layer and the negative photoresist as a patterning top layer, and performing low-temperature sputter deposition of SiO2 followed by lift-off, we could successfully fabricate damage-free indium-tin oxide (ITO) and Au MEA. The bi-layer LOR sputter deposition processed Au MEA showed an impedance value of 6 × 105 Ω (at 1 kHz), with good consistency over 60 electrodes. The passivation performance of the bi-layer LOR sputter-deposited SiO2 was tested by electrodepositing Au nanoparticles (NPs) on the Au electrode, resulting in the well-confined and uniformly coated Au NPs. The bi-layer LOR sputter deposition processed ITO, Au, and Au NP-modified MEAs were evaluated and found to have a neuronal spike recording capability at a single unit level, confirming the validity of the bi-layer LOR sputter deposition as an effective passivation technique in fabrication of a MEA. These results suggest that the damage-free Au MEA fabricated with bi-layer LOR sputter deposition would be a viable platform for screening surface modification techniques that are available in neuronal interfacing.