Besides silicon carbide, group-III nitrides are also suitable large-band-gap semiconductor materials for high-temperature gas sensor devices. Exposing GaN-based Schottky diodes with catalytically active platinum electrodes to hydrogen, we observed a decrease of the rectifying characteristics which we attribute to a decrease in Schottky barrier height. Current–voltage and elastic recoil detection measurements were used to investigate the H-sensing behavior of such devices. Our results indicate an interfacial effect as the origin of the sensor response to hydrogen.
High-electron-mobility transistors (HEMTs) based on AlGaN/GaN heterostructures were successfully tested as chemically sensing devices. Exposing the unprotected polar GaN surface in the gate area of a HEMT to liquids of different polarity, milliampere changes in the source-drain current could be detected. These sensing effects are likely to arise from chemical interactions with a sheet of ionic charge on the free GaN surface which compensates the electronic charge of a two-dimensional electron gas at a subsurface AlGaN/GaN interface.
In the present article recent results concerning sensor applications of AlGaN layers and AlGaN/GaN heterostructures are summarized. The piezoresistive effect in piezoelectric AlGaN layers is investigated and the dependence of the piezoresistive gauge factor on the Al content is attributed to the influence of strain induced piezoelectric fields. An enhancement of this effect is observed in AlGaN/GaN heterostructures, resulting in high longitudinal gauge factors.The response of gas sensitive Pt:GaN Schottky diodes to hydrogen and hydrogen containing gases is analyzed up to temperatures of 600°C and employed to realize gas sensitive field effect transistors which are demonstrated to operate up to 400°C. In addition, ion sensitive field effect transistors (ISFETs) have also been fabricated on the basis of AlGaN/GaN heterostructures. The GaN surface shows a high pH sensitivity which is attributed to the presence of a thin native metal oxide layer on the surface.
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