X-ray diffraction measurements were performed using a modified zone technique on Te-doped GaSb wafers, commonly used for molecular beam epitaxial growth, at temperatures between 32 and 546 °C to determine the thermal expansion. The authors found the thermal expansion to be very close to the data published by Bublik et al. [Phys. Status Solidi A 73, K271 (1982)]. Control measurements of the lattice constant of Si were found to agree with the results published by Okada and Tokumaru [J. Appl. Phys. 56, 314 (1984)] within our measurement error of ±2×10−4 Å. A fourth order polynomial, a(GaSb)(T)=6.0959+3.37×10−5T+5.63×10−8T2−1.29×10−10T3+1.05×10−13T4 (Å) (T in °C), was found to be a good fit to our data, while a linear fit with a constant thermal expansion coefficient of 7.17×10−6 K−1 was found to be a poorer fit.
Using x-ray diffraction, the in-plane and out-of-plane lattice constants of Al0.90Ga0.10AsySb1−y epilayers grown on GaSb and GaAs substrates were determined between 30 and 398 °C for y=0.003–0.059. The bulk lattice constant was then calculated from the in-plane and out-of-plane lattice constants. A polynomial function for the bulk lattice constant as a function of y and temperature was derived from a fit to the resulting data. Comparison to measured out-of-plane lattice constants of platinum-coated Al0.90Ga0.10AsySb1−y indicates that the polynomial function is valid up to around 550 °C. The polynomial function can be used to determine the lattice matching of Al0.90Ga0.10AsySb1−y to, e.g., GaSb at typical growth temperatures used for growth of cladding layers in laser structures. A formula is given for calculating the As mole fraction for lattice matching to GaSb at a given temperature.
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