In this paper we extend the analytical drift-diffusion model, or Hovel model, to model the electrical characteristics of solar cells incorporating a back mirror. We use a compact summation approach to derive modified optical generation functions in Homojunction solar cells, considering both coherent and incoherent reflections from the back reflector. These modified generation functions are then used to derive analytical formulae for the current-voltage characteristics of mirrored solar cells. We simulate the quantum efficiency of a simple GaAs np diode with a planar gold back reflector, and compare the results with the standard Hovel model using a generation function given by the Beer-Lambert law. Finally, we use the model to simulate the performance of a real GaAs solar cell device fabricated using an epitaxial-lift-off procedure, demonstrating excellent agreement between the simulated and measured characteristics.
Two-dimensional carrier profiling using scanning spreading resistance microscopy (SSRM) has recently been reported for Si- and InP-based structures. In this article, we report SSRM measurements solely on III–V material-based structures. We have studied GaAs and InP doping staircase structures, prepared using molecular-beam epitaxy. These structures were then used as calibration standards for the profiling of carrier density in state-of-the-art III–V-based optoelectronic devices. We discovered that SSRM data on GaAs can be obtained with either polarity; however, only one polarity (positive or negative sample bias for n- or p-GaAs, respectively) produces SSRM results that show quantitative correlation with dopant concentration as determined by secondary ion mass spectrometry (SIMS). In comparison, SSRM measurements using both bias polarities on n-InP correlates well with SIMS, while p-InP exhibits a similar polarity dependence to p-type GaAs. A physical model based on a Schottky junction is proposed to explain these results. We also report calibrated SSRM measurements on GaAs and InP heterojunction bipolar transistor structures.
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