We investigated the effect of deep-etched mesa sidewall profile and oxide overhang length on the regrowth structural characteristics for buriedheterostructure (BH) quantum cascade lasers (QCLs) grown by metalorganic chemical vapor deposition (MOCVD). The relationship between etched mesa sidewall geometry, oxide overhang length, oxide thickness, and growth uniformity was examined and is extensively discussed. In particular, anomalous growth in the vicinity of the oxide edge resulting from insufficient oxide overhang length was identified and studied. An ideal ratio of mesa height to oxide overhang length between 2.5 and 3.0 is proposed and experimentally justified to yield satisfactory planar regrowths without anomalous growth. Mesas in the ½011 direction with smoothly etched entrant profile yield a higher degree of growth uniformity than mesas in the [011] direction with the re-entrant profile.
We discuss an ultrawide, voltage-tunable type-II mid-IR interband cascade laser. Its design has a charge accumulation layers outside of the optically active quantum wells that unclamps the electron-hole concentrations and facilitates above-threshold Stark shifts. Our results demonstrate laser tuning of 120 nm ͑120 cm −1 ͒.
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