InGaN light emitting diodes (LED) structure with an embedded 1/4λ-stack nanoporous-GaN/undoped-GaN distributed Bragg reflectors (DBR) structure have been demonstrated. Si-heavily doped GaN epitaxial layers (n+-GaN) in the 12-period n+-GaN/u-GaN stack structure are transformed into low refractive index nanoporous GaN structure through the doping-selective electrochemical wet etching process. The central wavelength of the nanoporous DBR structure was located at 442.3 nm with a 57 nm linewidth and a 97.1% peak reflectivity. The effective cavity length (6.0λ), the effective penetration depth (278 nm) in the nanoporous DBR structure, and InGaN active layer matching to Fabry-Pérot mode order 12 were observed in the far-field photoluminescence radiative spectra. High electroluminescence emission intensity and line-width narrowing effect were measured in the DBR-LED compared with the non-treated LED structure. Non-linear emission intensity and line-width reducing effect, from 11.8 nm to 0.73 nm, were observed by increasing the laser excited power. Resonant cavity effect was observed in the InGaN LED with bottom nanoporous-DBR and top GaN/air interface.
The characteristics of the GaN based Vertical Light Emitting Diodes on Metal alloyed Substrate (VLEDMS) were investigated. The VLEDMS exhibits very good current-voltage behaviour with low average dynamic resistance of 0.7 Ω and low operated voltage of 3.2 V at 350 mA. High current operation up to 2000 mA in continuous mode was demonstrated without any performance deterioration. The high thermal conductivity of metal alloyed substrate demonstrated excellent heat dissipation capability. Chip scaling without efficiency loss shows a unique property of VLEDMS and enabled to enlarge up to 2 mm × 2 mm chip size. A light output efficiency of 70 lm/W or better was achieved in single chip or multiple chips package. Coupled with mass production ability, VLEDMS is very suitable for general lighting application.
A GaN/AlGaN ultraviolet light emitting diode (UV-LED) structure with a porous AlGaN reflector structure has been demonstrated. Inside the UV-LED, the n+-AlGaN/undoped-AlGaN stack structure was transformed into a porous-AlGaN/undoped-AlGaN stack structure through a doping-selective electrochemical etching process. The reflectivity of the porous AlGaN reflector was 93% at 374 nm with a stop-bandwidth of 35 nm. In an angle-dependent reflectance measurement, the central wavelength of the porous AlGaN reflector had blueshift phenomenon by increasing light-incident angle from 10° to 50°. A cut-off wavelength was observed at 349 nm due to the material absorption of the porous-AlGaN/u-AlGaN stack structure. In the treated UV-LED structure, the photoluminescence emission wavelength was measured at 362 nm with a 106° divergent angle covered by the porous-AlGaN reflector. The light output power of the treated UV-LED structure was higher than that of the non-treated UV-LED structure due to the high light reflectance on the embedded porous AlGaN reflector.
Vertical GaN based Light Emitting Diodes on metal alloy substrate (VLEDMS) were realized and characterized for solid state lighting application. An efficiency of more than 100 lumens/watt from a white LED was achieved. And, an efficiency of more than 80 lumens/watt from a high efficiency and high power green LED was achieved also. The dissipate heat more effectively than conventional and flip-chip LEDs, thanks to the higher thermal conductivity of a copper alloy substrate. This increases their maximum operating current and output power and makes them more suitable for solid-state lighting applications. In addition, these VLEDMS exhibit many advantages over those on sapphire under extreme operation conditions for general lighting application.
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