Plasmon-enhanced photoconductive antennas allow for improved performance, particularly in below-band-gap absorption devices using low-temperature-grown GaAs. Here we design the plasmonic nanostructures to act as antireflection coatings as well, achieving below 10% reflection at 1570 nm wavelength in an optimized device. Quantitative agreement is seen between experiment and theory. Terahertz emission field amplitudes demonstrate 18 times enhancement compared to that of a conventional terahertz photoconductive antenna on the same substrate.
An edge-guided mode isolator based on substrate integrated waveguide (SIW) technology is presented. A matching transition section from a ferrite isolator in a SIW to a microstrip is introduced and developed. Supporting experiments have been conducted to confirm the predicted performance of the new structure.
Photocurrent generation in low-temperature-grown GaAs (LT-GaAs) has been significantly improved by growing a thin AlAs isolation layer between the LT-GaAs layer and semi-insulating (SI)-GaAs substrate. The AlAs layer allows greater arsenic incorporation into the LT-GaAs layer, prevents current diffusion into the GaAs substrate, and provides optical back-reflection that enhances below bandgap terahertz generation. Our plasmon-enhanced LT-GaAs/AlAs photoconductive antennas provide 4.5 THz bandwidth and 75 dB signal-to-noise ratio (SNR) under 50 mW of 1570 nm excitation, whereas the structure without the AlAs layer gives 3 THz bandwidth, 65 dB SNR for the same conditions.
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