High-quality (Pb, La)(Ti, Zr)O3 films were grown on n-GaN. The film thickness ranged from 0.5 to 5 μm. The material was prepared by a chemical solution method with compositions of 8/65/35 and 0/52/48. The films grown on GaN buffered with a thin layer of indium in oxide were highly textured and exhibited excellent ferroelectric properties with Pr=20–26 μC/cm2. A large field-induced birefringence of 0.025 was measured in the film with a composition of 8/65/35 under a field strength of 2×105 V/cm.
Recent advances in the processing of complex oxide materials have allowed us to monolithically grow ferroelectrics, of the lead lanthanum zirconate titanate system, on a GaN/sapphire structure. The thickness of these ferroelectric films ranged from 0.5 to 5 μm. Strong electrooptic effect with field-induced birefringence, as large as 0.02, was measured for (Pb,La)(Zr,Ti)O3 layer grown on a GaN/sapphire structure. The applicability of the lead lanthanum zirconate titanate material as a light modulating medium, integrated with GaN-based devices, was further proven by demonstrating optical modulation of a laser beam in an Al/(Pb,La)(Zr,Ti)O3/GaN/sapphire structure.
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