Deep level optical spectroscopy (DLOS) and deep level transient spectroscopy (DLTS) measurements performed on Ni/β-Ga2O3 Schottky diodes fabricated on unintentionally doped (010) substrates prepared by edge-defined film-fed growth revealed a rich spectrum of defect states throughout the 4.84 eV bandgap of β-Ga2O3. Five distinct defect states were detected at EC − 0.62 eV, 0.82 eV, 1.00 eV, 2.16 eV, and 4.40 eV. The EC − 0.82 eV and 4.40 eV levels are dominant, with concentrations on the order of 1016 cm−3. The three DLTS-detected traps at EC − 0.62 eV, 0.82 eV, and 1.00 eV are similar to traps reported in Czochralski-grown β-Ga2O3, [K. Irmscher et al., J. Appl. Phys. 110, 063720 (2011)], suggesting possibly common sources. The DLOS-detected states at EC − 2.16 eV and 4.40 eV exhibit significant lattice relaxation effects in their optical transitions associated with strongly bound defects. As a consequence of this study, the Ni/β-Ga2O3 (010) Schottky barrier height was determined to be 1.55 eV, with good consistency achieved between different characterization techniques.
A systematic study of Schottky barriers fabricated on (010) β-Ga2O3 substrates is reported. Schottky barrier heights (SBHs) and current transport modes were analyzed using a combination of current-voltage (I-V), capacitance-voltage (C-V) and internal photoemission (IPE) measurements for Pd, Ni, Pt and Au Schottky diodes. Diodes fabricated for each metal choice displayed nearly ideal I-V characteristics with room temperature ideality factors ranging from 1.03 to 1.09, reverse leakage currents below detection limits and thermionic emission as the dominant current transport mode for Ni, Pt and Pd. The SBH values varied depending on the metal choice, ranging from 1.27 V for Pd and 1.54 V for Ni to 1.58 V for Pt and 1.71 V for Au, as determined using IPE measurements. Close agreement was observed between these IPE-determined SBH values and the barrier height values from I-V and C-V measurements for the Ni, Pd and Pt Schottky barriers. In contrast, for Au, a lack of general agreement was seen between the SBH measurement methods, the trends of which appear to be consistent with the presence of an inhomogeneous barrier that implies a more complex interface for the Au Schottky barrier. The dependence of the SBH on metal work function suggests that metal-(010) β-Ga2O3 interfaces are not fully pinned, and this assertion was supported by scanning Kelvin probe microscopy measurements made on this sample set.
Deep level defects were characterized in Ge-doped (010) β-Ga2O3 layers grown by plasma-assisted molecular beam epitaxy (PAMBE) using deep level optical spectroscopy (DLOS) and deep level transient (thermal) spectroscopy (DLTS) applied to Ni/β-Ga2O3:Ge (010) Schottky diodes that displayed Schottky barrier heights of 1.50 eV. DLOS revealed states at EC − 2.00 eV, EC − 3.25 eV, and EC − 4.37 eV with concentrations on the order of 1016 cm−3, and a lower concentration level at EC − 1.27 eV. In contrast to these states within the middle and lower parts of the bandgap probed by DLOS, DLTS measurements revealed much lower concentrations of states within the upper bandgap region at EC − 0.1 – 0.2 eV and EC − 0.98 eV. There was no evidence of the commonly observed trap state at ∼EC − 0.82 eV that has been reported to dominate the DLTS spectrum in substrate materials synthesized by melt-based growth methods such as edge defined film fed growth (EFG) and Czochralski methods [Zhang et al., Appl. Phys. Lett. 108, 052105 (2016) and Irmscher et al., J. Appl. Phys. 110, 063720 (2011)]. This strong sensitivity of defect incorporation on crystal growth method and conditions is unsurprising, which for PAMBE-grown β-Ga2O3:Ge manifests as a relatively “clean” upper part of the bandgap. However, the states at ∼EC − 0.98 eV, EC − 2.00 eV, and EC − 4.37 eV are reminiscent of similar findings from these earlier results on EFG-grown materials, suggesting that possible common sources might also be present irrespective of growth method.
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Understanding the unique properties of ultra-wide band gap semiconductors requires detailed information about the exact nature of point defects and their role in determining the properties. Here, we report the first direct microscopic observation of an unusual formation of point defect complexes within the atomic scale structure of β-Ga2O3 using high resolution scanning transmission electron microscopy (STEM). Each complex involves one cation interstitial atom paired with two cation vacancies. These divacancy -interstitial complexes correlate directly with structures obtained by density functional theory, which predicts them to be compensating acceptors in β-Ga2O3. This prediction is confirmed by a comparison between STEM data and deep level optical spectroscopy results, which reveals that these complexes correspond to a deep trap within the band gap, and that the development of the complexes is facilitated by Sn doping through the increase in vacancy concentration. These findings provide new insight on this emerging material's unique response to the incorporation of impurities that can critically influence their properties.
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