We report on studies of field-effect transistor (FET) and transparent thin-film transistor (TFT) devices based on lightly Ta-doped SnO2 nano-wires. The nanowire-based devices exhibit uniform characteristics with average field-effect mobilities exceeding 100 cm2/V x s. Prototype nano-wire-based TFT (NW-TFT) devices on glass substrates showed excellent optical transparency and transistor performance in terms of transconductance, bias voltage range, and on/off ratio. High on-currents and field-effect mobilities were obtained from the NW-TFT devices even at low nanowire coverage. The SnO2 nanowire-based TFT approach offers a number of desirable properties such as low growth cost, high electron mobility, and optical transparency and low operation voltage, and may lead to large-scale applications of transparent electronics on diverse substrates.

We report the growth and characterization of single-crystalline Sn-doped In 2 O 3 (ITO) and Mo-doped In 2 O 3 (IMO) nanowires. Epitaxial growth of vertically aligned ITO nanowire arrays was achieved on ITO/yttria-stabilized zirconia (YSZ) substrates. Optical transmittance and electrical transport measurements show that these nanowires are high-performance transparent metallic conductors with transmittance of ∼85% in the visible range, resistivities as low as 6.29 × 10 -5 Ω·cm and failure-current densities as high as 3.1 × 10 7 A/cm 2 . Such nanowires will be suitable in a wide range of applications including organic light-emitting devices, solar cells, and field emitters. In addition, we demonstrate the growth of branched nanowire structures in which semiconducting In 2 O 3 nanowire arrays with variable densities were grown epitaxially on metallic ITO nanowire backbones.One-dimensional (1D) nanostructures such as nanowires, nanorods, and nanobelts have become the focus of intensive investigation in the past decade as potential building blocks for nanoscale devices and sensors. 1-5 Along with group IV and III-V materials, metal oxide (including In 2 O 3 , SnO 2 and ZnO) nanowires have been widely studied due to their excellent electrical and optical properties and ease of fabrication. [6][7][8] In these studies the metal oxide nanowires are typically not intentionally doped, and the carriers are normally generated by structural defects such as oxygen deficiencies. As a result, the devices behave as wide band gap semiconductors whose performance is influenced by the surrounding environment. 8 On the other hand, intentional doping can greatly modify the device properties and yield new device applications. One such example is tin-doped indium oxide (ITO), in which metal-like behavior is achieved when In 2 O 3 is degenerately doped by Sn. Due to its high conductivity and high transmittance in the visible spectral region, 9 ITO has become by far the most important transparent conducting oxide material, and ITO films have found applications in various optoelectronic devices such as flatpanel displays, solar cells, and light-emitting diodes. [10][11][12] The ability to obtain highly transparent and highly conducting ITO nanowires may potentially further enhance the performance of such devices due to the increased effective device area using nanowire electrodes. Furthermore, similar to NiSi and TaSi 2 nanowires, 13,14 the highly conducting ITO nanowires may also be used as interconnects in integrated nanocsale devices.The growth of ITO nanowires/nanorods has been reported by several groups since the first study on In 2 O 3 nanobelts in 2001. [15][16][17][18][19][20][21] However, detailed electrical characterizations have not been reported, and it is not clear whether these ITO nanowire/nanorods have the desired electrical properties. For example, the only reported resistivity value is ∼0.4 Ω‚cm, 18 which is several orders higher than that can be obtained in commercially available ITO films 9 and clearly too high ...

Graphene-boron nitride monolayer heterostructures contain adjacent electrically active and insulating regions in a continuous, single-atom thick layer. To date structures were grown at low pressure, resulting in irregular shapes and edge direction, so studies of the graphene-boron nitride interface were restricted to microscopy of nano-domains. Here we report templated growth of single crystalline hexagonal boron nitride directly from the oriented edge of hexagonal graphene flakes by atmospheric pressure chemical vapor deposition, and physical property measurements that inform the design of in-plane hybrid electronics. Ribbons of boron nitride monolayer were grown from the edge of a graphene template and inherited its crystallographic orientation. The relative sharpness of the interface was tuned through control of growth conditions. Frequent tearing at the graphene-boron nitride interface was observed, so density functional theory was used to determine that the nitrogen-terminated interface was prone to instability during cool down. The electronic functionality of monolayer heterostructures was demonstrated through fabrication of field effect transistors with boron nitride as an in-plane gate dielectric.

The authors report the growth and characterization of single-crystalline, degenerately Sb-doped SnO2 (SnO2:Sb) nanowires. The in situ doped SnO2:Sb nanowires are transparent conductors with resistivities down to 4.1×10−4Ωcm and failure-current densities up to 2.1×107A∕cm2. High carrier concentrations (>1020cm−3) and minimal environmental effects were also observed and attributed to effective Sb doping. The SnO2:Sb nanowires can be obtained at large quantities using a low-cost vapor transport method and may provide a suitable alternative to indium tin oxide as transparent conducting oxide materials. Field emission devices with SnO2:Sb nanowire cathodes and anodes exhibited an ultralow turn-on voltage of 2V.

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