Atomic layer deposition (ALD) raises global interest through its unparalleled conformality. This work describes new microscopic lateral high-aspect-ratio (LHAR) test structures for conformality analysis of ALD. The LHAR structures are...

Unparalleled conformality is driving ever new applications for atomic layer deposition (ALD), a thin film growth method based on repeated self-terminating gas-solid reactions. In this work, we re-implemented a diffusion-reaction...

Understanding how hydrotreating oxygen-containing compounds together with nitrogen-containing compounds affects the reactivity and selectivity is relevant for processing renewable feedstocks. In this work, competitive hydrodeoxygenation (HDO) and hydrodenitrogenation (HDN) reactions were studied by co-hydrotreating palmitic acid (C16 acid) and tetradecylamine (C14 amine) over a Pt/ZrO2 catalyst in a batch reactor. HDO proceeded faster than HDN in the studied system, and the deoxygenation reactions were found to have an inhibitory effect on HDN. Co-hydrotreating the C16 acid and the C14 amine expanded the reaction network from the individual HDO and HDN networks and changed the prevailing reaction pathways, initially in favor of oxygen removal. The formation of heavy secondary amides and amines through condensation reactions became increasingly favored as the share of C16 acid in the feed increased. For a given conversion level, the condensation product selectivity was observed to increase as the reaction temperature was decreased, whereas increasing the reaction temperature promoted the formation of the desired paraffins. This work described the ease of HDO compared to HDN, the role of condensation reactions in the co-hydrotreating reaction network, and the inhibitory effect on HDN thereof.

Unparalleled conformality is driving ever new applications for atomic layer deposition (ALD), a thin film growth method based on repeated self-terminating gas-solid reactions. In this work, we re-implemented a diffusion-reaction model from the literature to simulate the propagation of film growth in wide microchannels and used that model to explore trends in both the thickness profile as a function of process parameters and different diffusion regimes. In the model, partial pressure of ALD reactant was analytically approximated. Simulations were made as function of kinetic and process parameters such as temperature, (lumped) sticking coefficient, molar mass of the ALD reactant, reactant’s exposure time and pressure, total pressure, density of the grown material, and growth per cycle (GPC) of the ALD process. Increasing the molar mass and the GPC, for example, resulted in a decreasing penetration depth into the microchannel. The influence of the mass and size of the inert gas molecules on the thickness profile depended on the diffusion regime (free molecular flow vs. transition flow). The modelling was compared to a recent slope method to extract the sticking coefficient. The slope method gave systematically somewhat higher sticking coefficient values compared to the input sticking coefficient values; potential reasons behind the observed differences are discussed.