The synthesis of ketoiminato copper(ii) complexes [Cu(OCRCHC(CH3)NCH2CH2X)(μ-OAc)]2 (X = NMe2: 4a, R = Me; 4b, R = Ph. X = OMe: 5, R = Me) and [Cu(OCRCHCMeNCH2CH2NEt2)(OAc)] (6, R = Me) from RC(O)CHC(CH3)N(H)CH2CH2X (X = NMe2: 1a, R = Me; 1b, R = Ph. X = NEt2: 1c, R = Me. X = OMe: 2, R = Me) and [Cu(OAc)2·H2O] (3) is reported. The molecular solid-state structures of 4-6 were determined by single crystal X-ray diffraction studies, showing that 4a,b and 5 are dimers which are set up by two [{Cu(μ-OAc)L}] (L = ketoiminato ligand) units featuring a square-planar Cu2O2 core with a distorted square-pyramidal geometry at Cu(ii). In contrast, 6 is monomeric with a tridentate-coordinated OCMeCHCMeNCH2CH2NEt2 ligand and a σ-bonded acetate group, thus inducing a square-planar environment around Cu(ii). The thermal behavior of all complexes was studied by TG (Thermogravimetry) and DSC (Differential Scanning Calorimetry) under an atmosphere of Ar and O2. Complex 4b shows the highest first onset temperature at 213 °C (under O2) and 239 °C (Ar). PXRD studies confirmed the formation of CuO under an atmosphere of O2 and Cu/Cu2O under Ar. TG-MS studies, exemplarily carried out with 4a, indicate the elimination of the ketoiminato ligands with detectable fragments such as m/z = 15, 28, 43, 44, 45, and 60 at a temperature above 250 °C. Vapor pressure measurements displayed that 5 shows the highest volatility of 3.6 mbar at 70 °C (for comparison, 4a, 1.4; 4b, 1.3; 6, 0.4 mbar) and hence 4a and 5 were used as MOCVD precursors for Cu/Cu2O deposition on Si/SiO2 at substrate temperatures of 450 °C and 510 °C. The deposition experiments were carried out under an atmosphere of nitrogen as well as oxygen. The as-obtained layers were characterized by SEM, EDX, XPS, and PXRD, showing that with oxygen as the reactive gas a mixture of metallic copper and copper(i) oxide without carbon impurities was formed, while under N2 Cu films with 53-68 mol% C contamination were produced. In a deposition experiment using precursor 5 at 510 °C under N2 a pure copper film was obtained.
Two CuII complexes of tridentate Schiff base ligands, [Cu(L1)(CH3OH)2]NO3·CH3OH (1) and [Cu2(L2)2(CH3OH)2](NO3)2 (2), were prepared and characterized by elemental analyses and spectroscopic methods [H2L1 = (E)‐N‐(4‐hydroxy benzoic acid (2‐hydroxy‐3‐methoxybenzylidene)benzohydrazide, and H2L2 = (E)‐N‐4‐hydroxy benzoic acid (5‐bromo‐2‐hydroxybenzylidene)benzohydrazide]. The crystal structures of 1 and 2 were established by X‐ray crystallography. The complex cation in 1 is based on a square pyramid with the uninegative Schiff base coordinating in a tridentate mode via O, N, O′‐donor atoms with the remaining sites being occupied by two methanol oxygen atoms with one of these in the axial position. By contrast, the Schiff base coordinates in a tridentate ligand fashion in dinuclear compound 2 as the phenoxide oxygen atom bridges two central copper atoms. The NO4 coordination donor set is completed by a methanol oxygen atom, which occupies an axial position in the distorted square pyramidal arrangement. Complexes 1 and 2 are very active catalysts in clean epoxidation reactions using aqueous hydrogen peroxide and acetonitrile. The effects of reaction parameters such as solvent and oxidant in the epoxidation of cis‐cyclooctene were investigated and showed that cyclooctene and cyclohexene were oxidized efficiently to their corresponding epoxide with 100 and 31 % selectivity, respectively, in the presence of catalyst 2. This catalytic system showed also excellent selectivity in the oxidation of benzyl alcohol.
The synthesis and characterization of bis (ketoiminato) Complexes 3a-c were used as MOCVD precursors for the deposition of thin MgO films on silicon substrates. It was found that only with 3a,c thin, dense and rather granulated MgO layers of thicknesses between 28-147 nm were produced. The as-deposited MgO layers were characterized by SEM, EDX, and XPS measurements and the thicknesses of the as-deposited layers were measured by Ellipsometry and SEM cross-section images. Apart from magnesium and oxygen a carbon content between 3-4 mol% was determined.
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