This paper reports an analysis of gate misalignment effect on the threshold voltage of double-gate ultrathin fully depleted silicon-on-insulator nMOS devices using a compact model considering the fringing electric field effect, biased at zero-bias DS . Using the conformal mapping transformation approach, a closed-form compact model considering the fringing electric field effect in the nongate overlap region has been derived to provide an accurate prediction of the threshold voltage behavior as verified by the two-dimensional simulation results.

Si nanocrystals embedded in a SiO2 matrix and an n-type Al-doped ZnO (ZnO:Al) layer were applied to improve the external quantum efficiency from Si in n- ZnO/SiO2-Si nanocrystals-SiO2/p-Si heterojunction light-emitting diodes (LEDs). The Si nanocrystals were grown by low pressure chemical vapor deposition and the ZnO:Al layer was prepared by atomic layer deposition. The n-type ZnO:Al layer acts as an electron injection layer, a transparent conductive window, and an anti-reflection coating to increase the light extraction efficiency. Owing to the spatial confinement of carriers and surface passivation by the surrounding SiO2, the Si nanocrystals embedded in the SiO2 matrix lead to a significant enhancement of the light emission efficiency from Si. An external quantum efficiency up to 4.3 x 10(-4) at the wavelength corresponding to the indirect bandgap of Si was achieved at room temperature.

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