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The increasing energy demands of modern society require a deep understanding of the properties of energy storage materials, as well as the tuning of their performance. We show that the capacitance of graphene oxide (GO) can be precisely tuned using a simple electrochemical reduction route. In situ resistance measurements, in combination with cyclic voltammetry measurements and Raman spectroscopy, have shown that upon reduction GO is irreversibly deoxygenated, which is further accompanied by structural ordering and an increase in electrical conductivity. The capacitance is maximized when the concentration of oxygen functional groups is properly balanced with the conductivity. Any further reduction and deoxygenation leads to a gradual loss of capacitance. The observed trend is independent of the preparation route and the exact chemical and structural properties of GO. It is proposed that an improvement in the capacitive properties of any GO can be achieved by optimization of its reduction conditions.

Unambiguous evidence is presented that the chloride ions play a dual role in the formation of a micrometre thick film of polymerized [Cu-Cl-MBI] n . This occurs when the copper is exposed to 3 wt.% NaCl solution containing 1 mM of mixture of inhibitors 2-mercaptobenzimidazole, MBI, and octylphosphonic acid, OPA, in the molar ratio MBI:OPA of 9:1. The chloride ions act simultaneously as a promoter of polymerized [Cu–MBI] n /[Cu–Cl–MBI] n film formation and a reactant that is incorporated in the film, as confirmed by time-of-flight secondary ion mass spectrometry. Also, formation of a Cu2O film under the Cu-inhibitor film was proven by focused ion beam microscopy, with chemical analysis being employed at the cross-section of the thick polymerized film. The Cu(I) oxide underlayer, together with the porous straw-like morphology of the [Cu–Cl–MBI] n overlayer, is believed to be responsible for the excellent corrosion protection of copper, even in a chloride environment without the reservoir of MBI+OPA. We also report a new insight into the mechanism of degradation of the Cu–MBI/Cu–Cl–MBI film that results in the formation of (MBI)2 dimers. The inhibitor layer, formed in NaCl solution and containing the synergistic combination of MBI and OPA, showed outstanding resistance to degradation.