Structured illumination microscopy utilizes illumination of periodic light patterns to allow reconstruction of high spatial frequencies, conventionally doubling the microscope's resolving power. This Letter presents a structured illumination microscopy scheme with the ability to achieve 60 nm resolution by using total internal reflection of a double moiré pattern in high-index materials. We propose a realization that provides dynamic control over relative amplitudes and phases of four coherently interfering beams in gallium phosphide and numerically demonstrate its capability.
Structured illumination microscopy (SIM) improves spatial resolution by folding high-frequency spectral components into the optical system's passband. While linear SIM is superior in terms of temporal resolution, living-cells imaging compatibility, and overall optical setup simplicity relative to other super-resolution techniques, it is, however, inferior when it comes to spatial resolution enhancement capability. In this letter, we present experimental demonstration of a novel Multi MoiréSIM (MM-SIM) scheme achieving improved lateral resolution enhancement while preserving the inherent advantages of linear SIM. Using MM-SIM, an approximately 4-fold lateral resolution enhancement was achieved, effectively increasing the optical system's NA from 0.4 to 1.6. The MM-SIM scheme is a simple and robust realization of 4-fold resolution enhancement capable of unleashing the full potential of standing-wave total internal reflection fluorescence structured illumination microscopy (TIRF-SIM) while preserving the inherent advantages of SIM.
We propose a Deep Learning (DL) framework for reconstructing super-resolved images in structured illumination microscopy, which reduces the amount of raw data required for the reconstruction and allows real-time super resolution imaging.
We present direct far-field measurements of short-wavelength surface plasmon polaritons (SPP) by conventional optics means. Plasmonic wavelength as short as 231 nm was observed for 532 nm illumination on a Ag−Si3N4 platform, demonstrating the capability to characterize SPPs well below the optical diffraction limit. This is done by scaling a sub-wavelength interferometric pattern to a far-field resolvable periodicity. These subwavelength patterns are obtained by coupling light into counter-propagating SPP waves to create a standing-wave pattern of half the SPP wavelength periodicity. Such patterns are mapped by a scattering slit, tilted at an angle so as to increase the periodicity of the intensity pattern along it to more than the free-space wavelength, making it resolvable by diffraction limited optics. The simplicity of the method as well as its large dynamic range of measurable wavelengths make it an optimal technique to characterize the properties of plasmonic devices and high-index dielectric waveguides, to improve their design accuracy and enhance their functionality.
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