Nano-structuring of metals is one of the greatest challenges for the future of plasmonic and photonic devices. Such a technological challenge calls for the development of ultra-fast, high-throughput and low-cost fabrication techniques. Laser processing, accounts for the aforementioned properties, representing an unrivalled tool towards the anticipated arrival of modules based in metallic nanostructures, with an extra advantage: the ease of scalability. In the present work we take advantage of the ability to tune the laser wavelength to either match the absorption spectral profile of the metal or to be resonant with the plasma oscillation frequency, and demonstrate the utilization of different optical absorption mechanisms that are size-selective and enable the fabrication of pre-determined patterns of metal nanostructures. Thus, we overcome the greatest challenge of Laser Induced Self Assembly by combining simultaneously large-scale character with atomic-scale precision. The proposed process can serve as a platform that will stimulate further progress towards the engineering of plasmonic devices.

Owing to their ability to generate non‐classical light states, quantum dots (QDs) are very promising candidates for the large‐scale implementation of quantum information technologies. However, the high photon collection efficiency demanded by these technologies may be impossible to reach for “standalone” semiconductor QDs, embedded in a high‐refractive index medium. In this work a novel laser writing technique is presented, enabling the direct fabrication of a QD self‐aligned—with a precision of ±30 nm—to a dielectric microsphere. The presence of the microsphere leads to an enhancement of the QD luminescence collection by a factor 7.3 ± 0.7 when an objective with 0.7 numerical aperture is employed. This technique exploits the possibility of breaking the N−H bonds in GaAs1−xNx:H by a laser light, obtaining a lower‐bandgap material, GaAs1−xNx. The microsphere, deposited on top of a GaAs1−xNx:H/GaAs quantum well, is used to generate a photonic nanojet, which removes hydrogen exactly below the microsphere, creating a GaAs1−xNx QD at a predefined distance from the sample surface. Second‐order autocorrelation measurements confirm the ability of the QDs obtained with this technique to emit single photons.

We use low-resolution optical lithography joined with solid state dewetting of crystalline, ultra-thin silicon on insulator (c-UT-SOI) to form monocrystalline, atomically smooth, silicon-based Mie resonators in well-controlled large periodic arrays. The dewetted islands have a typical size in the 100 nm range, about one order of magnitude smaller than the etching resolution. Exploiting a 2 µm thick SiO2 layer separating the islands and the underlying bulk silicon wafer, we combine the resonant modes of the antennas with the etalon effect. This approach sets the resonance spectral position and improves the structural colorization and the contrast between scattering maxima and minima of individual resonant antennas. Our results demonstrate that templated dewetting enables the formation of defect-free, faceted islands that are much smaller than the nominal etching resolution and that an appropriate engineering of the substrate improves their scattering properties. These results are relevant to applications in spectral filtering, structural color and beam steering with all-dielectric photonic devices.

The importance of the monomer's isomeric structure in the design of new D–A copolymers for various applications.

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We report on the dewetting process, in a high vacuum environment, of amorphous Ge thin films on SiO2/Si (001). A detailed insight of the dewetting is obtained by in situ reflection high-energy electron diffraction and ex situ scanning electron microscopy. These characterizations show that the amorphous Ge films dewet into Ge crystalline nano-islands with dynamics dominated by crystallization of the amorphous material into crystalline nano-seeds and material transport at Ge islands. Surface energy minimization determines the dewetting process of crystalline Ge and controls the final stages of the process. At very high temperatures, coarsening of the island size distribution is observed.

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