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Electrochemical methods for the high resolution etching of metals as well as the deposition of metals in polymer films and on conducting substrates are presented. These faradaic processes were carried out with a scanning electrochemical microscope (SECM) (similar in design to the scanning tunneling microscope) and different ionically conducting polymer films such as Nation, poly(4-vinylpyridine), and poly(bis-(methoxyethoxyethoxide)phosphazene) on the substrate. Continuous patterns of silver, gold, copper, and palladium were deposited, and copper, silver, and gold were etched with widths in the submicron range. The use of polymer-coated substrate electrodes to deposit and etch metals is compared to depositions and etchings performed in electrolyte solutions. ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 131.111.185.72 Downloaded on 2015-04-03 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 131.111.185.72ABSTRACT Current and potential distributions have been investigated on linear and annular arrangements of two coplanar electrodes comprising a galvanic couple. An asymptotic technique is used to derive analytical results, valid under conditions of thin layer electrolyte. Dimensionless parameters are derived which enable comparison of the asymptotic results with previous calculations performed for general conditions. The closed form asymptotic results show excellent agreement

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