We report the first observation of epsilon-near-zero (ENZ) phonon polaritons in an ultrathin AlN film fully hybridized with surface phonon polaritons (SPhP) supported by the adjacent SiC substrate. Employing a strong coupling model for the analysis of the dispersion and electric field distribution in these hybridized modes, we show that they share the most prominent features of the two precursor modes. The novel ENZ-SPhP coupled polaritons with a highly propagative character and deeply subwavelength light confinement can be utilized as building blocks for future infrared and terahertz nanophotonic integration and communication devices.

The microstructure of InxAl1−xN∕GaN heterostructures (where x∼0.13–0.19), grown by molecular beam epitaxy, was investigated by transmission electron microscopy. Observations in the cross-section and plan-view geometries show evidence for lateral phase separation originating at the GaN surface that results in a vertical honeycomblike structure within the InAlN layers. The lateral dimensions of the honeycomb cells are ∼5–10nm. The vertical walls are In rich with a width of ∼1–2nm and align roughly perpendicular to ⟨112¯0⟩ and ⟨11¯00⟩ directions. The phase separation is attributed to random compositional fluctuations during the early stages of growth, possibly associated with misfit-strain relaxation.

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ScxAl1-xN is a promising ultra-wide bandgap material with a variety of potential applications in electronic, optoelectronic, and acoustoelectric devices related to its large piezoelectric and spontaneous polarization coefficients. We demonstrate growth of ScxAl1-xN on GaN and SiC substrates using plasma-assisted molecular beam epitaxy with x = 0.14–0.24. For metal-rich growth conditions, mixed cubic and wurtzite phases formed, while excellent film quality was demonstrated under N-rich growth conditions at temperatures between 520 and 730 °C. An rms roughness as low as 0.7 nm and 0002 rocking curve full-width at half maximum as low as 265 arc sec were measured for a Sc0.16Al0.84 N film on GaN. To further demonstrate the quality of the ScAlN material, a high-electron-mobility transistor heterostructure with a Sc0.14Al0.86 N barrier, GaN/AlN interlayers, and a GaN buffer was grown on SiC, which showed the presence of a two-dimensional electron gas with a sheet charge density of 3.4 × 1013 cm−2 and a Hall mobility of 910 cm2/V·s, resulting in a low sheet resistance of 213 Ω/◻.

Immense optical field enhancement was predicted to occur for the Berreman mode in ultrathin films at frequencies in the vicinity of epsilon near zero (ENZ). Here, we report the first experimental proof of this prediction in the mid-infrared by probing the resonantly enhanced second harmonic generation (SHG) at the longitudinal optic phonon frequency from a deeply subwavelength-thin aluminum nitride (AlN) film. Employing a transfer matrix formalism, we show that the field enhancement is completely localized inside the AlN layer, revealing that the observed SHG signal of the Berreman mode is solely generated in the AlN film. Our results demonstrate that ENZ Berreman modes in intrinsically low-loss polar dielectric crystals constitute a promising platform for nonlinear nanophotonic applications. KeywordsBerreman mode, epsilon near zero, infrared, nanophotonics, second harmonic generation, field enhancementIn nanophotonics, nonlinear optical phenomena are driven by the enhancement of local optical fields, which arises due to polaritonic