In the paper given by these authors this spring at Photomask Japan, investigations into the advances in the CATS TM tool that combine hierarchical fracturing and distributed processing were begun. In addition to the beneficial reduction in processing times, various shortcomings of the software were detailed.For this study, the next version of the CATS software tool has been made available and those shortcomings are remedied. Difficult model OPC (MOPC) fractures and complicated de-slivering fractures for variable shaped beam machines are analyzed. Timing results, exclusive-OR operations, and the implications of Amdahl's Law are also considered. Further intricacies of Linux cluster computing are also addressed.
As the industry accelerates the reduction in sub-wavelength device feature sizes, it is necessary that the traditional barriers between design, mask data preparation (MDP), and the lithography process be broken down or eliminated. These processes, which now possess increased levels of complexity and interconnectivity, can no longer work independently but must be linked and all applicable information about the processes propagated upstream.Options associated with phase shift masks, optical proximity correction, increasing constraints for the minimum defect size requirements, improving yield and throughput, etc. have been key to the increased demands placed on the photomask manufacturers. Knowledge of the lithographic performance of a selected option prior to mask build is key to reducing mask cost, improving turn around time and staying on the aggressive path established by the mask user.Integrating CD and lithographic process window analysis with MDP provides a convenient means of helping the mask makers to predict the performance of a mask within the wafer fab. This paper will discuss the integration of CD and lithographic process window analysis tools with CATS TM mask data preparation software. The benefits of implementing this methodology will be explored and illustrated with data.
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