In this paper, we develop an explicit model to predict the DC electrical behavior in ultra-thin surrounding gate junctionless nanowire FET. The proposed model takes into account 2D electrical and geometrical confinements of carrier charge density within few discrete sub-bands. Combining a parabolic approximation of the Poisson equation, first order perturbation theory for the Schrdinger subband energy eigenvalues, and Fermi-Dirac statistics for the confined carrier density leads to an explicit solution of the DC characteristic in ultra-thin junctionless devices. Validity of the model has been verified with technology computeraided design simulations. The results confirms its validity for all regions of operation, i.e., from deep depletion to accumulation and from linear to saturation. This represents an essential step toward analysis of circuits based on junctionless nanowire devices.
Divacancies near or at lattice defects in SiC, the PL5–PL7 photoluminescence centers, are known to have more favorable optical and spin properties for applications in quantum technology compared to the usual divacancies. These centers were previously predicted to be divacancies near stacking faults. Using electron paramagnetic resonance, we observe PL5, PL6, and four other divacancy-like centers, labeled PLa–PLd, in electron-irradiated high-purity semi-insulating (HPSI) 4H-SiC. From the observed fine-structure D-tensors, we show that these centers including PL6, which has so far been believed to be an axial center, all have C1h symmetry. Among these, PLa, PLc, and PLd are basal divacancies and PL5 and PL6 are slightly deviated from axial symmetry, while PLb is different from others with the principal Dzz axis of the D-tensor aligning at ∼34° off the c-axis. We show that these modified divacancies are only detected in one type of HPSI materials but not in commercial n- and p-type substrates or n-type pure epitaxial layers irradiated by electrons regardless of surface treatments which are known to create stacking faults.
The negatively charged silicon vacancy V S i − $\left({\mathrm{V}}_{\mathrm{S}\mathrm{i}}^{-}\right)$ in silicon carbide is a well-studied point defect for quantum applications. At the same time, a closer inspection of ensemble photoluminescence and electron paramagnetic resonance measurements reveals an abundance of related but so far unidentified signals. In this study, we search for defects in 4H-SiC that explain the above magneto-optical signals in a defect database generated by automatic defect analysis and qualification (ADAQ) workflows. This search reveals only one class of atomic structures that exhibit silicon-vacancy-like properties in the data: a carbon antisite (CSi) within sub-nanometer distances from the silicon vacancy only slightly alters the latter without affecting the charge or spin state. Such a perturbation is energetically bound. We consider the formation of V S i − + C S i ${\mathrm{V}}_{\mathrm{S}\mathrm{i}}^{-}+{\mathrm{C}}_{\mathrm{S}\mathrm{i}}$ up to 2 nm distance and report their zero phonon lines and zero field splitting values. In addition, we perform high-resolution photoluminescence experiments in the silicon vacancy region and find an abundance of lines. Comparing our computational and experimental results, several configurations show great agreement. Our work demonstrates the effectiveness of a database with high-throughput results in the search for defects in quantum applications.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.
hi@scite.ai
10624 S. Eastern Ave., Ste. A-614
Henderson, NV 89052, USA
Copyright © 2024 scite LLC. All rights reserved.
Made with 💙 for researchers
Part of the Research Solutions Family.