Figure 1: From sketch to garment. Left to right: sketched contours and darts; 3D shape computed using distance field; piecewise developable surface; final virtual garment, compared with the real one sewn from the 2D patterns we output. AbstractModeling dressed characters is known as a very tedious process. It usually requires specifying 2D fabric patterns, positioning and assembling them in 3D, and then performing a physically-based simulation. The latter accounts for gravity and collisions to compute the rest shape of the garment, with the adequate folds and wrinkles. This paper presents a more intuitive way to design virtual clothing. We start with a 2D sketching system in which the user draws the contours and seam-lines of the garment directly on a virtual mannequin. Our system then converts the sketch into an initial 3D surface using an existing method based on a precomputed distance field around the mannequin. The system then splits the created surface into different panels delimited by the seam-lines. The generated panels are typically not developable. However, the panels of a realistic garment must be developable, since each panel must unfold into a 2D sewing pattern. Therefore our system automatically approximates each panel with a developable surface, while keeping them assembled along the seams. This process allows us to output the corresponding sewing patterns. The last step of our method computes a natural rest shape for the 3D garment, including the folds due to the collisions with the body and gravity. The folds are generated using procedural modeling of the buckling phenomena observed in real fabric. The result of our algorithm consists of a realistic looking 3D mannequin dressed in the designed garment and the 2D patterns which can be used for distortion free texture mapping. The patterns we create also allow us to sew real replicas of the virtual garments.

Quasi-developable mesh segmentation is required for many applications in graphics and CAD, including texture atlas generation and the design of patterns for model fabrication from sheets of material. In this work we introduce D-Charts, a simple and robust algorithm for mesh segmentation into (nearly) developable charts. As part of our method we introduce a new metric of developability for mesh surfaces. Thanks to this metric, using our segmentation for texture atlas generation, we can bound the distortion of the atlas directly during the segmentation stage. We demonstrate that by using this bound, we generate more isometric atlases for the same number of charts compared to existing state-of-the-art techniques. Using our segmentation algorithm we also develop a technique for automatic pattern design. To demonstrate the practicality of this technique, we use the patterns produced by our algorithm to make fabric and paper copies of popular computer graphics models.

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