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There is a need for new techniques that modify metallic implant surfaces, resulting in good bone response for low density areas. Among the different techniques, plasma nitriding is being applied in biomedicine with excellent results. However, its use in titanium dental implants is very limited owing to high process temperatures (between 700 and 800uC) that result in distortions. In order to solve this problem, the authors used a new plasma method with a hollow cathode discharge configuration. Ti grade II dental implants were nitrided in a 20% N 2 -H 2 atmosphere at a temperature of 450uC, 150 Pa (1?5 mbar), for 1 h and inserted into rabbit tibias to assess osseointegration. The results showed that plasma nitriding caused a significant change in the surface texture of the nitrided implants and greater removal torque than that of the control implants.

Titanium samples have been used as the substrate that was submitted to a plasma discharge nitriding for the surface treatment of dental implants. Two different arrangements regarding the electrode shapes were tested: planar and hollow cathode. The treated samples were evaluated regarding surface phases, texture, roughness, layer thickness, wettability and visual appearance. The roughness of the surface of all samples submitted to the plasma nitriding process was lower compared to those treated by commercially available technology plasma spray, on the other hand, better wettability was achieved. Some commercially available implants were also treated under the best conditions found with the experiment at titanium samples. After plasma nitriding these implants, tests were carried out to evaluate both wettability and surface texture. As a result the treated implants had both their surface texture and wettability improved.

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