2 I. Prencipe et al.Abstract A number of laser facilities coming online all over the world promise the capability of high-power laser experiments with shot repetition rates between 1 and 10 Hz. Target availability and technical issues related to the interaction environment could become a bottleneck for the exploitation of such facilities. In this paper, we report on target needs for three different classes of experiments: dynamic compression physics, electron transport and isochoric heating, and laser-driven particle and radiation sources. We also review some of the most challenging issues in target fabrication and high repetition rate operation. Finally, we discuss current target supply strategies and future perspectives to establish a sustainable target provision infrastructure for advanced laser facilities.

The machining process of transparent materials using the laser induced backside wet etching (LIBWE) procedure was studied. In the course of this, experimental investigations and numerical calculations were carried out. Fused silica plates were irradiated by an ArF excimer laser, using a naphthalene–methyl methacrylate solution as an absorbing liquid (concentration 0.85 mol dm−3, absorption coefficient at 193 nm 52 200 cm−1). The etch rate dependence on the applied laser fluence (varied from 110 to 860 mJ cm−2) was derived from the etch depths, measured using an atomic force microscope (AFM). The etch rate was found to be 4.7–49.5 nm/pulse, depending on the laser fluence. The surface morphology of the etched edges was also investigated by AFM. A fast photographic arrangement was used for time resolved observation of bubble development in the liquid absorbent, which is an important phenomenon of LIBWE. The internal pressure of the expanding bubbles was calculated using recorded snapshots. It was found to be 22–120 MPa 17.2 ns after the excimer pulse peak. The one-dimensional heat flow equation, including the melting of the treated fused silica layer and the vaporization of the absorbing solution, was solved using the finite difference method. The surface temperature of the fused silica was found to be a maximal 17.2 ns after the excimer pulse peak. Based on our results, we present a possible interpretation of the LIBWE procedure of fused silica.

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Fused silica gratings with periods of 154 nm, 266 nm, and 550 nm have been fabricated by the method of two-beam interferometric laser induced backside wet etching (TWIN-LIBWE). The spatially filtered pulses at 266nm were splitted into two parts and interfered at an incident angle of 60(o), 30(o), and 14(o), respectively, on the backside surface of a fused silica plate contacting with the liquid absorber. The morphology of the etched gratings was characterized by atomic force microscope. According to our knowledge, the produced 154 nm period is the smallest grating constant generated by laser techniques directly in fused silica at present.