Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.
Classically, a dwell-time map is created with a method such as deconvolution or numerical optimization, with the input being a surface error map and influence function. This dwell-time map is the numerical optimum for minimizing residual form error, but it takes no account of machine dynamics limitations. The map is then reinterpreted as machine speeds and accelerations or decelerations in a separate operation. In this paper we consider combining the two methods in a single optimization by the use of a constrained nonlinear optimization model, which regards both the two-norm of the surface residual error and the dwell-time gradient as an objective function. This enables machine dynamic limitations to be properly considered within the scope of the optimization, reducing both residual surface error and polishing times. Further simulations are introduced to demonstrate the feasibility of the model, and the velocity map is reinterpreted from the dwell time, meeting the requirement of velocity and the limitations of accelerations or decelerations. Indeed, the model and algorithm can also apply to other computer-controlled subaperture methods.
A calibrated and predictive model of the removal function has been established based on the analysis of a magnetorheological finishing (MRF) process. By introducing an efficiency coefficient of the removal function, the model can be used to calibrate the removal function in a MRF figuring process and to accurately predict the removal function of a workpiece to be polished whose material is different from the spot part. Its correctness and feasibility have been validated by simulations. Furthermore, applying this model to the MRF figuring experiments, the efficiency coefficient of the removal function can be identified accurately to make the MRF figuring process deterministic and controllable. Therefore, all the results indicate that the calibrated and predictive model of the removal function can improve the finishing determinacy and increase the model applicability in a MRF process.
High-precision optical component manufacturing by ion beam machining tools with ultra-high material removal resolution and dynamically adjustable removal efficiency is important in various industries. In this paper, we propose a low-energy pulsed ion beam (LPIB) technology that can obtain a single pulse with high-resolution material removal by adjusting the pulse frequency and duty cycle, and enable the dynamic adjustment of the removal efficiency. The pulse frequency is 1–100 Hz, and the duty cycle is 0–100%. For monocrystalline silicon, the pulse frequency and duty cycle are set to 100 Hz and 1%, respectively; thus, the single-shot pulse depth removal resolution of material is 6.7 × 10−4 nm, which means every 21 pulses can remove one silicon atom layer. Compared with IBF, where the removal resolution of the maximum depth is about 0.01 nm, the controllable resolution is one to two orders of magnitude higher. There is a linear relationship between the removal efficiency of the pulsed ion beam removal function and the pulse duty ratio. The material removal of a single pulse can be adjusted in real time by adjusting the pulse duty cycle and frequency. Owing to its high resolution and wide adjustable removal efficiency, LPIB has broad application prospects in the field of sub-nano-precision surface modification, quality tuning of inertial resonant devices, and so on. This technology is expected to advance surface processing and ultra-precision manufacturing.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.