ZrO2 sols were prepared with hydrothermal synthesis method. The ZrO2films were characterized or examined by many kinds of instruments. With different content of zirconium oxychloride octahydrate, the particle sizes of ZrO2 sols are different from 3nm to 25nm. And 1-on-1 laser-induced damage threshold tests on ZrO2 films were carried out with a Q–switched Nd-YAG high power laser at 1064 nm. The experimental results showed that the ZrO2 sols is suitable for preparing ZrO2thin film and the refractive index and thickness of this thin films achieve our requirement.
By PECVD deposition technology, we mainly investigated the influence of substrate on intrinsic amorphous/microcrystalline silicon thin film prepared at 300°C. We study the crystallization ratio, grain size of the silicon thin film specially. The results reveal that the crystallization ratio and grain size of the silicon thin film changed along with different substrates. The silicon thin film crystallization ratio and grain size changed sharply when using glass and stainless steel substrate. On this work we think ideal μc-Si:H can be obtained by using glass as substrate and in the suitable experimental conditions.
ZrO2 sols were obtained by hydrothermal synthesis. With different hydrothermal synthesis time, ZrO2 particle size varied from 5nm to 16nm. And ZrO2 thin films were prepared with spin coating method. ZrO2 thin films were characterized or examined by many kinds of instruments. And 1-on-1 laser-induced damage threshold tests on ZrO2 films were carried out. Refractive index and thickness of the ZrO2-PVP films were measured by means of automatic scanning spectroscopic ellipsometer and the refractive index of ZrO2 -PVP film changed with the addition of PVP content.
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