Highlights d 35 fungal species were isolated from the ocean, sponge, coral, and coastal sediment d Time-lapse imaging reveals unusual cell cycles, cell-division patterns, and polarity
Fungi have been found in every marine habitat that has been explored, however, the diversity and functions of fungi in the ocean are poorly understood. In this study, fungi were cultured from the marine environment in the vicinity of Woods Hole, MA, USA including from plankton, sponge and coral. Our sampling resulted in 36 unique species across 20 genera. We observed many isolates by time-lapse differential interference contrast (DIC) microscopy and analyzed modes of growth and division. Several black yeasts displayed highly unconventional cell division cycles compared to those of traditional model yeast systems. Black yeasts have been found in habitats inhospitable to other life and are known for halotolerance, virulence, and stress-resistance. We find that this group of yeasts also shows remarkable plasticity in terms of cell size control, modes of cell division, and cell polarity. Unexpected behaviors include division through a combination of fission and budding, production of multiple simultaneous buds, and cell division by sequential orthogonal septations. These marine-derived yeasts reveal alternative mechanisms for cell division cycles that seem likely to expand the repertoire of rules established from classic model system yeasts.
In eukaryotes, gene expression depends on chromatin organization. However, how chromatin affects the transcription dynamics of individual RNA polymerases has remained elusive. Here, we use dual trap optical tweezers to study single yeast RNA polymerase II (Pol II) molecules transcribing along a DNA template with two nucleosomes. The slowdown and the changes in pausing behavior within the nucleosomal region allow us to determine a drift coefficient, χ , which characterizes the ability of the enzyme to recover from a nucleosomal backtrack. Notably, χ can be used to predict the probability to pass the first nucleosome. Importantly, the presence of a second nucleosome changes χ in a manner that depends on the spacing between the two nucleosomes, as well as on their rotational arrangement on the helical DNA molecule. Our results indicate that the ability of Pol II to pass the first nucleosome is increased when the next nucleosome is turned away from the first one to face the opposite side of the DNA template. These findings help to rationalize how chromatin arrangement affects Pol II transcription dynamics.T o accommodate the massive amount of genetic material within the nucleus, DNA is packaged into chromatin. The level of chromatin compaction determines the accessibility of the underlying DNA, which in turn impacts gene expression (1). The first step in gene expression is transcription, where RNA polymerase II (Pol II) processively moves along the DNA template to generate an RNA copy. However, how chromatin impacts the translocation dynamics of individual RNA polymerases has remained unclear.The fundamental unit of chromatin is a single nucleosome, which consists of 147 bp of DNA wrapped ∼ 1.7 times around a histone octamer (2). In vitro experiments have revealed that a single nucleosome exhibits a significant mechanical barrier to the transcribing Pol II (3-7). Using optical tweezers, it was shown that a nucleosome both decreases the rate of forward translocation and increases polymerase pausing and backtracking (3, 5). These changes have been suggested to depend on the unwrapping dynamics of the nucleosome itself, which are governed by nucleosomal properties such as the histones' modification state as well as the underlying DNA sequence (3, 5).In vivo, the process of chromatin transcription is far more complex. Chromatin accessibility is affected by many accessory factors that facilitate the progression of RNA polymerases through nucleosomal obstacles (1). A central outstanding question is to what extent the nucleosomal arrangement affects Pol II transcription behavior. This arrangement might be particularly important in budding yeast, an organism with a compact genome with short internucleosomal distances (8-11).Here, we study the impact of the arrangement of two nucleosomes on the nucleosomal transcription performance of individual molecules of Pol II. We use dual-trap optical tweezers in a single-molecule approach to follow single enzymes of Pol II as they progress through a dinucleosomal array (3, 5). Specifi...
Chromatic polynomials and related graph invariants are central objects in both graph theory and statistical physics. Computational difficulties, however, have so far restricted studies of such polynomials to graphs that were either very small, very sparse, or highly structured. Recent algorithmic advances (New J. Phys. 11:023001, 2009) now make it possible to compute chromatic polynomials for moderately sized graphs of arbitrary structure and number of edges. Here we present chromatic polynomials of ensembles of random graphs with up to 30 vertices, over the entire range of edge density. We specifically focus on the locations of the zeros of the polynomial in the complex plane. The results indicate that the chromatic zeros of random graphs have a very consistent layout. In particular, the crossing point, the point at which the chromatic zeros with non-zero imaginary part approach the real axis, scales linearly with the average degree over most of the density range. While the scaling laws obtained are purely empirical, if they continue to hold in general there are significant implications: the crossing points of chromatic zeros in the thermodynamic limit separate systems with zero ground state entropy from systems with positive ground state entropy, the latter an exception to the third law of thermodynamics.
Process window qualification using focus-exposure wafers is an essential step in lithography and a key use case for CD-SEM metrology. An automated analysis using the correlation between CD and focus/dose is easily possible but rarely done due to missing safety checks. Pattern fidelity that is analyzed by eye and problematic focus/dose conditions that may cause pattern degradation are excluded by hand. Specifically, when EUV lithography is utilized for exposing the most critical layers, roughness estimation becomes much more important, as it will restrict the process window further. We develop and describe unbiased and stable roughness estimates for contact hole patterns and integrate them into the process window analysis pipeline and inline monitoring routine. The analysis goes beyond simple roughness values and can detect a variety of possible CD-SEM measurement problems and shape deviations as well. Furthermore, we introduce a novel image-based machine-learning approach to detect outliers and quantify defective or abnormal patterns. Notably, the underlying model does not require knowledge of the types of CD features or design information for which outliers should be detected. We demonstrate that the approach can reliably detect local defects and a variety of other pattern anomalies. Using the generated visualizations, images with anomalous features can be flagged automatically and the locations of the defects or deviations are pinpointed. The approach yields not only the final missing piece in automated process window qualification, but also new opportunities to monitor pattern fidelity in lithographical semi-conductor processes.
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