ZrNx thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O2–N2, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrNx thin films were characterized by a high nanohardness of 26–27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrNx thin films declined after they were annealed owing to the formation of ZrO2 scales.
Ta-Zr-N thin films were fabricated through co-deposition of radio-frequency magnetron sputtering and high-power impulse magnetron sputtering (HIPIMS/RFMS co-sputtering). The oxidation resistance of the fabricated films was evaluated by annealing the samples in a 15-ppm O 2 -N 2 atmosphere at 600 • C for 4 and 8 h. The mechanical properties and surface roughness of the as-deposited and annealed thin films were evaluated. The results indicated that the HIPIMS/RFMS co-sputtered Ta-Zr-N thin films exhibited superior mechanical properties and lower surface roughness than did the conventional direct current-sputtered Ta-Zr-N thin films and HIPIMS-fabricated ZrN x thin films in both the as-deposited and annealed states.
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