The effects of a SiO2
layer grown on a Si substrate and the CuO additive in
GeO2 powders for the
enhanced growth of Ge–Si1−xGexOy
and GeO2–Si1−xGexOy
core–shell nanowires (hereafter referred to as
Ge–Si1−xGexOy
and GeO2–Si1−xGexOy
nanowires, respectively) via carbothermal reduction at
1050–1100 °C in flowing Ar
were studied. Using GeO2
powders as the feedstock alone, nanowires having a composition of
Ge–Si1−xGexOy were
grown on a SiO2/Si
substrate, whereas the same nanowires could not be grown on a Si substrate. Adding CuO into
GeO2 powders enhanced
the growth of GeO2–Si1−xGexOy and
Ge–Si1−xGexOy
nanowires on the Si substrate as well as that of
GeO2–Si1−xGexOy nanowires
on the SiO2/Si
substrate. The crystal growth mechanism seems to follow the vapour–solid process. The present study
reveals that the oxidation of the Si substrate plays an important role in enhancing the growth of
Ge–Si1−xGexOy
and GeO2–Si1−xGexOy nanowires via
carbothermal reduction of GeO2
powders. The mechanisms for the precipitation of the Ge or
GeO2 core inside
the Si1−xGexOy shell
on Si and SiO2/Si
substrates are discussed, respectively.
Si 1−x Ge x O y nanowire (SiGeONW) assemblies with cord-, chain-, and tubelike morphologies were grown on a Si substrate via the carbothermal reduction of GeO 2 /CuO powders at 1100°C in Ar. The growth of various SiGeONWs assemblies follows the vapor-liquid-solid process. The CuSiGe droplets formed during the growth of SiGeONWs simultaneously play the roles of catalyst and reactant. The morphology of SiGeONWs assemblies is not temperature controlled but dependent on the Cu concentration and the size of CuSiGe catalysts. This phenomenon is unlike the Geand Ga-catalyzed growth of SiO x nanowire assemblies. In addition, the processing parameters and the mechanisms for the growth of SiGeONWs assemblies with various morphologies are discussed.
The effects of moist Ar on the growth of
Ge–GeOx core–shell
nanowires (Ge–GeOx
NWs) and Si1−xGexOy
nanowires (SiGeONWs) on Si substrates without adding a metal catalyst via the carbothermal reduction of
GeO2 powders
at 1100 °C
were studied. No significant nanowires were grown in dry Ar at a flow rate of 100–300 sccm
until a bit of water in the range of 0.5–2 ml was loaded into the furnace. More water suppressed
the growth of nanowires because of the exhaustion of more graphite powder. The growth of
Ge–GeOx
NWs and SiGeONWs follows the vapor–solid and vapor–liquid–solid processes, respectively.
The present study showed that the water vapor serves as an oxidizer as well as a reducer at
1100 °C in enhancing the growth
of SiGeONWs and Ge–GeOx
NWs, respectively. The growth mechanisms of
Ge–GeOx
NWs and SiGeONWs are also discussed.
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