In the pursuit of two-dimensional (2D) materials beyond graphene, enormous advances have been made in exploring the exciting and useful properties of transition metal dichalcogenides (TMDCs), such as a permanent band gap in the visible range and the transition from indirect to direct band gap due to 2D quantum confinement, and their potential for a wide range of device applications. In particular, recent success in the synthesis of seamless monolayer lateral heterostructures of different TMDCs via chemical vapor deposition methods has provided an effective solution to producing an in-plane p-n junction, which is a critical component in electronic and optoelectronic device applications. However, spatial variation of the electronic and optoelectonic properties of the synthesized heterojunction crystals throughout the homogeneous as well as the lateral junction region and the charge carrier transport behavior at their nanoscale junctions with metals remain unaddressed. In this work, we use photocurrent spectral atomic force microscopy to image the current and photocurrent generated between a biased PtIr tip and a monolayer WSe2-MoS2 lateral heterostructure. Current measurements in the dark in both forward and reverse bias reveal an opposite characteristic diode behavior for WSe2 and MoS2, owing to the formation of a Schottky barrier of dissimilar properties. Notably, by changing the polarity and magnitude of the tip voltage applied, pixels that show the photoresponse of the heterostructure are observed to be selectively switched on and off, allowing for the realization of a hyper-resolution array of the switchable photodiode pixels. This experimental approach has significant implications toward the development of novel optoelectronic technologies for regioselective photodetection and imaging at nanoscale resolutions. Comparative 2D Fourier analysis of physical height and current images shows high spatial frequency variations in substrate/MoS2 (or WSe2) contact that exceed the frequencies imposed by the underlying substrates. These results should provide important insights in the design and understanding of electronic and optoelectronic devices based on quantum confined atomically thin 2D lateral heterostructures.
An order-of-magnitude increase of photoluminescence (PL) efficiency at room temperature has been observed in the GaAs/InAs quantum dots (QDs)-in-a-well structure grown with in situ irradiation of atomic hydrogen supplied by a radio-frequency hydrogen-plasma source. The enhancement in PL intensity rapidly increases with the hydrogen flow rate and is stable with a variation of excitation power in the radio-frequency plasma source. Extensive thermal annealing of grown samples up to 634 °C did not show any significant degradation of photoluminescence intensity compared with the reference sample. The reduction of nonradiative recombination centers in the as-grown sample causes the greatly enhanced luminescence property. In addition to PL enhancement the authors observed that the H-assisted growth of InAs QDs has suppressed bimodal distribution of QD shape. In contrast to the hydrogen-plasma-assisted growth, irradiation by hydrogen in molecular form has a detrimental effect on the optical properties of similar structures. The high thermal stability of improved optical properties suggests that the formation of the defects which are responsible for nonradiative recombination channels is suppressed during H-assisted epitaxy although in situ defect passivation by atomic hydrogen cannot be completely ruled out.
Achieving low Schottky barriers interface is important for future electronic devices based on transition metal dichalcogenides. In this study, we demonstrate that the electronic properties of single-layer molybdenum disulfide (MoS2) can be tuned from semiconducting to metallic via controlling its defect level (sulfur vacancy) by using hydrogen plasma. Raman, Photoluminescence, Atomic Force Microscopy, and X-ray photoelectron spectra suggest that the top layer sulfur in SL-MoS2 can be totally removed and stabilized in ambient environment. Field-effect transistors (FETs) with highly sulfur vacancies/Ti electrodes fabricated and exhibited high performance n-FETs. The results provide a promising route for low Schottky barrier contacts devices with graded junction interface.
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