A twice wafer-transfer technique can be used to fabricate high-brightness p-side-up thin-film AlGaInP-based light-emitting diodes (LEDs) with an indium-tin oxide (ITO) transparent conductive layer directly deposited on a GaP window layer, without using postannealing. The ITO layer can be used to improve light extraction, which enhances light output power. The p-side-up thin-film AlGaInP LED with an ITO layer exhibited excellent performance stability (e.g., emission wavelength and output power) as the injection current increased. This stability can be attributed to the following factors: 1) Refractive index matching, performed by introducing ITO between the epoxy and the GaP window layer enhances light extraction; and 2) The ITO layer is used as the current spreading layer to reduce the thermal accumulation in the epilayers.
ZnO nanorods grown via hydrothermal method on the aluminum-doped zinc oxide (AZO) thin film were used to fabricate high-brightness p-side-up thin-film AlGaInP lightemitting diodes (LEDs). The AZO thin film was not only used as current spreading layers but also as a seed layer of ZnO nanorods. The AZO thin film was prepared using atomic layer deposition. The ZnO nanorods improved light extraction, thus increasing the light output power of the LEDs. The output powers of LEDs with optimum ZnO nanorod structures were increased by 32% at an injection current of 700 mA, as compared with that of an LED with AZO thin film. The emission wavelength shifts of LEDs with an AZO thin film and optimum ZnO nanorod structure were 18 and 11 nm, respectively, when the injection current was increased from 20 to 1000 mA. The ZnO nanorods not only provide more light extraction but also keep the thermal stability of the LED device without any degradation. The results are promising for the developed high brightness AlGaInP LED applications with low fabrication cost through ZnO nanorods grown by hydrothermal method to enhance the light extraction efficiency.
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