The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.
In this work, we present the effect of DC power from 100 W to 500 W on the structural and hydrophilic activity of TiO2 films. The TiO2 films were prepared by DC magnetron sputtering on the glass substrate without any external heating. The structure of TiO2 films were analyzed by atomic force microscope and X-ray diffraction. XRD patterns indicated the films were amorphous. The surface roughness and grain size were enlarged by the increasing of the DC power while the substrate temperature was climbed up with the increasing of the DC power. From the point of energetic ion bombardment, it was related with DC power between sputtering processes. The hydrophilic activity of TiO2 films were analyzed by the contact angle meter. The water contact angle decrease with increasing of the DC power.
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